Annealing pressure induced ions transfer in Cobalt-Ferrite thin films on amorphous SiO₂/Si substrates

Engineering

• Silicon Dioxide 100%
• Thin Films 100%
• Si Substrate 100%
• Raman Spectra 50%
• Silicon Substrate 50%
• Pulsed Laser 50%
• Ray Absorption 50%
• Preferred Orientation 50%
• Co-Ions 50%
• Saturation Magnetization 50%
• Crystalline Quality 50%
• Iron Ion 50%

Material Science

• Film 100%
• Thin Films 100%
• Cobalt 100%
• Annealing 50%
• Silicon 50%
• Cobalt Ion 50%
• Absorption Spectra 25%
• Magnetism 25%
• Silicon Dioxide 25%
• Amorphous Silicon 25%
• Pulsed Laser Deposition 25%
• Iron Ion 25%

Keyphrases

• Cobalt Ferrite Films 100%
• Ion Transfer 100%
• Site Exchange 50%