Application development of virtual metrology in semiconductor industry

Chang Yung Cheng Jonathan, Fan Tien Cheng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

59 Citations (Scopus)

Abstract

Daily wafer fabrication in semiconductor foundry depends on considerable metrology operations for tool-quality and process-quality assurance. The metrology operations required a lot of metrology tools, which increase FAB's investment Also, these metrology operations will increase cycle time of wafer process. Metrology operations do not bring any value added to wafer but only quality assurance. This article provides a new method denoted virtual metrology (VM) to utilize sensor data collected from 300mm FAB's tools to forecast quality data of wafers and tools. This proposed method designs key steps to establish a VM control model based on neural networks and to develop and deploy applications following SEMI EDA (equipment data acquisition) standards.

Original languageEnglish
Title of host publicationIECON 2005
Subtitle of host publication31st Annual Conference of IEEE Industrial Electronics Society
Pages124-129
Number of pages6
DOIs
Publication statusPublished - 2005
EventIECON 2005: 31st Annual Conference of IEEE Industrial Electronics Society - Raleigh, NC, United States
Duration: 2005 Nov 62005 Nov 10

Publication series

NameIECON Proceedings (Industrial Electronics Conference)
Volume2005

Other

OtherIECON 2005: 31st Annual Conference of IEEE Industrial Electronics Society
Country/TerritoryUnited States
CityRaleigh, NC
Period05-11-0605-11-10

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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