Application of a new airbridge-gate structure for high-performance Ga0.51In0.49P/In0.15Ga0.85As/GaAs pseudomorphic field-effect transistors

Wen Chau Liu, Wen Lung Chang, Hsi Jen Pan, Kuo Hui Yu, Shung Ching Feng, Wen Shiung Lour

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

An airbridge-gate structure with multiple piers was used to create an efficient Ga0.51In0.49P/In0.15Ga0.85As/GaAs pseudomorphic heterostructure field-effect transistor (FET). The FET can simultaneously provide a high gate-to-drain breakdown voltage and broad and linear transconductance. Adopting the airbridge-gate technique hinders parasitic capacitance as well as show a wide and flat operation regime of the current gain frequency (fT) and maximum oscillation frequency (fmax).

Original languageEnglish
Pages (from-to)1996-1998
Number of pages3
JournalApplied Physics Letters
Volume74
Issue number14
DOIs
Publication statusPublished - 1999 Apr 5

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Fingerprint

Dive into the research topics of 'Application of a new airbridge-gate structure for high-performance Ga0.51In0.49P/In0.15Ga0.85As/GaAs pseudomorphic field-effect transistors'. Together they form a unique fingerprint.

Cite this