TY - JOUR
T1 - Application of blue laser direct-writing equipment for manufacturing of periodic and aperiodic nanostructure patterns
AU - Chen, Po Yu
AU - Jywe, Wen Yuh
AU - Wang, Ming Shi
AU - Wu, Chia Hung
N1 - Funding Information:
This work was supported by the National Science Council of Taiwan under grant 97-3114-M-150-001 .
Publisher Copyright:
© 2016 Elsevier Inc.
PY - 2016/10/1
Y1 - 2016/10/1
N2 - This study presents the novel development of low cost, highly efficient blue laser direct-writing equipment for using mask-less laser lithography to manufacture periodic and aperiodic nanostructure patterns. The system includes a long-stroke linear motor precision stage (X, Y), a piezoelectric nano-precision stage (Y, θz), a 3-DOF (degrees of freedom) laser interferometer measurement system, and a blue laser direct-writing optical system. The 3-DOF laser interferometer measurement system gives the control system feedback for displacement (X, Y, θz) of the equipment. The laser processing equipment consists of a blue laser direct-writing optical head, a field-programmable gate array (FPGA) alignment interface, and an optical head servo controller. The optical head operates at a wavelength of 405 nm. Processing the nanostructures on thermo-reaction inorganic resists with precise control of the laser intensity, taking advantage of the threshold effect to exceed the limitations of optical diffraction, and reduces the nanostructure hole size. The equipment can be used to fabricate various periodic nanostructure patterns, aperiodic nanostructure patterns, and two-dimensional patterns. The equipment positioning accuracy is within 50 nm at a speed of 50 mm/s, and the minimum critical dimension can be achieved about 100 nm or so.
AB - This study presents the novel development of low cost, highly efficient blue laser direct-writing equipment for using mask-less laser lithography to manufacture periodic and aperiodic nanostructure patterns. The system includes a long-stroke linear motor precision stage (X, Y), a piezoelectric nano-precision stage (Y, θz), a 3-DOF (degrees of freedom) laser interferometer measurement system, and a blue laser direct-writing optical system. The 3-DOF laser interferometer measurement system gives the control system feedback for displacement (X, Y, θz) of the equipment. The laser processing equipment consists of a blue laser direct-writing optical head, a field-programmable gate array (FPGA) alignment interface, and an optical head servo controller. The optical head operates at a wavelength of 405 nm. Processing the nanostructures on thermo-reaction inorganic resists with precise control of the laser intensity, taking advantage of the threshold effect to exceed the limitations of optical diffraction, and reduces the nanostructure hole size. The equipment can be used to fabricate various periodic nanostructure patterns, aperiodic nanostructure patterns, and two-dimensional patterns. The equipment positioning accuracy is within 50 nm at a speed of 50 mm/s, and the minimum critical dimension can be achieved about 100 nm or so.
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U2 - 10.1016/j.precisioneng.2016.05.006
DO - 10.1016/j.precisioneng.2016.05.006
M3 - Article
AN - SCOPUS:84992573941
SN - 0141-6359
VL - 46
SP - 263
EP - 269
JO - Precision Engineering
JF - Precision Engineering
ER -