Application of combinatorial methodologies for work function engineering of metal gate/high-κ advanced gate stacks

M. L. Green, Kao-Shuo Chang, S. DeGendt, T. Schram, J. Hattrick-Simpers

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

This paper uses combinatorial methodologies to investigate the effect of TaN-AlN metal gate electrode composition on the work function, for (TaN-AlN)/Hf-Si-O/SiO2/Si capacitors. We demonstrate the efficacy of the combinatorial technique by plotting work function for more than thirty Ta1-xAlxNy compositions, with x varying from 0.05 to 0.50. The work function is shown to continuously decrease, from about 4.9 to about 4.7 eV, over this range. Over the same range, oxide fixed charge is seen to go from about -2.5 × 1012 cm-3 to about zero. The work functions reported here are about 0.1 eV higher than in a previous study, but are still about 0.2 eV smaller than required for PMOS device applications.

Original languageEnglish
Pages (from-to)2209-2212
Number of pages4
JournalMicroelectronic Engineering
Volume84
Issue number9-10
DOIs
Publication statusPublished - 2007 Sep 1

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Metals
engineering
methodology
metals
plotting
Chemical analysis
Oxides
capacitors
Capacitors
Electrodes
electrodes
oxides

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

Green, M. L. ; Chang, Kao-Shuo ; DeGendt, S. ; Schram, T. ; Hattrick-Simpers, J. / Application of combinatorial methodologies for work function engineering of metal gate/high-κ advanced gate stacks. In: Microelectronic Engineering. 2007 ; Vol. 84, No. 9-10. pp. 2209-2212.
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Application of combinatorial methodologies for work function engineering of metal gate/high-κ advanced gate stacks. / Green, M. L.; Chang, Kao-Shuo; DeGendt, S.; Schram, T.; Hattrick-Simpers, J.

In: Microelectronic Engineering, Vol. 84, No. 9-10, 01.09.2007, p. 2209-2212.

Research output: Contribution to journalArticle

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AB - This paper uses combinatorial methodologies to investigate the effect of TaN-AlN metal gate electrode composition on the work function, for (TaN-AlN)/Hf-Si-O/SiO2/Si capacitors. We demonstrate the efficacy of the combinatorial technique by plotting work function for more than thirty Ta1-xAlxNy compositions, with x varying from 0.05 to 0.50. The work function is shown to continuously decrease, from about 4.9 to about 4.7 eV, over this range. Over the same range, oxide fixed charge is seen to go from about -2.5 × 1012 cm-3 to about zero. The work functions reported here are about 0.1 eV higher than in a previous study, but are still about 0.2 eV smaller than required for PMOS device applications.

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