Abstract
A joint development project to deploy a Tube-to-Tube (T2T) control scheme for Plasma-Enhanced Chemical Vapor Deposition (PECVD) utilizing the Automatic Virtual Metrology (AVM) system is in progress. In the PECVD process utilized in solar cell manufacturing, the sampling rate is less than 10%. However, T2T control requires 100% total inspection. To accomplish this requirement, a large number of measurements are needed and therefore production cycle time and cost increase. Virtual Metrology (VM) is proposed to resolve this problem. However, a key problem prohibiting effective utilization of VM in T2T control is its inability to take the reliance level in the VM feedback loop of T2T control into consideration. In addition, adopting an unreliable VM value may lead to worse results than not utilizing VM. In this article, the proposed T2T controller utilizes the VM value and its accompanying reliance index and global similarity index of the current run as well as information about a batch obtained in the first run to calculate a suggestion value of the deposition time for the following run to improve the process capability index and resolve unreliability issues.
| Original language | English |
|---|---|
| Pages (from-to) | 670-681 |
| Number of pages | 12 |
| Journal | IIE Transactions (Institute of Industrial Engineers) |
| Volume | 45 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 2013 Jun 1 |
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All Science Journal Classification (ASJC) codes
- Industrial and Manufacturing Engineering
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Applying the Automatic Virtual Metrology system to obtain tube-to-tube control in a PECVD tool. / Cheng, Fan Tien; Chiu, Yu Chen.
In: IIE Transactions (Institute of Industrial Engineers), Vol. 45, No. 6, 01.06.2013, p. 670-681.Research output: Contribution to journal › Article
TY - JOUR
T1 - Applying the Automatic Virtual Metrology system to obtain tube-to-tube control in a PECVD tool
AU - Cheng, Fan Tien
AU - Chiu, Yu Chen
PY - 2013/6/1
Y1 - 2013/6/1
N2 - A joint development project to deploy a Tube-to-Tube (T2T) control scheme for Plasma-Enhanced Chemical Vapor Deposition (PECVD) utilizing the Automatic Virtual Metrology (AVM) system is in progress. In the PECVD process utilized in solar cell manufacturing, the sampling rate is less than 10%. However, T2T control requires 100% total inspection. To accomplish this requirement, a large number of measurements are needed and therefore production cycle time and cost increase. Virtual Metrology (VM) is proposed to resolve this problem. However, a key problem prohibiting effective utilization of VM in T2T control is its inability to take the reliance level in the VM feedback loop of T2T control into consideration. In addition, adopting an unreliable VM value may lead to worse results than not utilizing VM. In this article, the proposed T2T controller utilizes the VM value and its accompanying reliance index and global similarity index of the current run as well as information about a batch obtained in the first run to calculate a suggestion value of the deposition time for the following run to improve the process capability index and resolve unreliability issues.
AB - A joint development project to deploy a Tube-to-Tube (T2T) control scheme for Plasma-Enhanced Chemical Vapor Deposition (PECVD) utilizing the Automatic Virtual Metrology (AVM) system is in progress. In the PECVD process utilized in solar cell manufacturing, the sampling rate is less than 10%. However, T2T control requires 100% total inspection. To accomplish this requirement, a large number of measurements are needed and therefore production cycle time and cost increase. Virtual Metrology (VM) is proposed to resolve this problem. However, a key problem prohibiting effective utilization of VM in T2T control is its inability to take the reliance level in the VM feedback loop of T2T control into consideration. In addition, adopting an unreliable VM value may lead to worse results than not utilizing VM. In this article, the proposed T2T controller utilizes the VM value and its accompanying reliance index and global similarity index of the current run as well as information about a batch obtained in the first run to calculate a suggestion value of the deposition time for the following run to improve the process capability index and resolve unreliability issues.
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UR - http://www.scopus.com/inward/citedby.url?scp=84875404678&partnerID=8YFLogxK
U2 - 10.1080/0740817X.2012.725507
DO - 10.1080/0740817X.2012.725507
M3 - Article
AN - SCOPUS:84875404678
VL - 45
SP - 670
EP - 681
JO - IISE Transactions
JF - IISE Transactions
SN - 2472-5854
IS - 6
ER -