Athermal recrystallization behavior of (Sn) solid-solution at an intermetallic-free Cu/Sn interface induced by room temperature electromigration

Chien Lung Liang, Kwang-Lung Lin

Research output: Contribution to journalArticle

Abstract

The present study, for the first time, revealed the athermal recrystallization behavior at a heterogeneous metallic interface using room temperature electromigration. The athermal recrystallization occurred within the meta-stable amorphous Cu-Sn interphase, which was formed during the early stage electromigration, for stress relaxation after further electromigration. The nano-scale polycrystalline (Sn) interphase was favorably recrystallized at the intermetallic-free Cu/Sn interface where the current crowding effect occurred. Athermal electromigration force facilitated the nucleation of Sn nuclei through the kinetic energy provided by the electron momentum transfer. The formation of the recrystallized (Sn) interphase is believed to be an intermediate material interaction product prior to further intermetallic nucleation under room temperature electromigration.

LanguageEnglish
Pages607-610
Number of pages4
JournalMaterials Letters
Volume236
DOIs
Publication statusPublished - 2019 Feb 1

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Nanocrystalline alloys
metallurgy
copper alloys
Electromigration
electromigration
Copper alloys
Binary alloys
amorphous materials
stress relaxation
Stress relaxation
Metallurgy
binary alloys
Kinetic energy
Nanocrystals
Intermetallics
intermetallics
Solid solutions
nanocrystals
Nucleation
solid solutions

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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abstract = "The present study, for the first time, revealed the athermal recrystallization behavior at a heterogeneous metallic interface using room temperature electromigration. The athermal recrystallization occurred within the meta-stable amorphous Cu-Sn interphase, which was formed during the early stage electromigration, for stress relaxation after further electromigration. The nano-scale polycrystalline (Sn) interphase was favorably recrystallized at the intermetallic-free Cu/Sn interface where the current crowding effect occurred. Athermal electromigration force facilitated the nucleation of Sn nuclei through the kinetic energy provided by the electron momentum transfer. The formation of the recrystallized (Sn) interphase is believed to be an intermediate material interaction product prior to further intermetallic nucleation under room temperature electromigration.",
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AB - The present study, for the first time, revealed the athermal recrystallization behavior at a heterogeneous metallic interface using room temperature electromigration. The athermal recrystallization occurred within the meta-stable amorphous Cu-Sn interphase, which was formed during the early stage electromigration, for stress relaxation after further electromigration. The nano-scale polycrystalline (Sn) interphase was favorably recrystallized at the intermetallic-free Cu/Sn interface where the current crowding effect occurred. Athermal electromigration force facilitated the nucleation of Sn nuclei through the kinetic energy provided by the electron momentum transfer. The formation of the recrystallized (Sn) interphase is believed to be an intermediate material interaction product prior to further intermetallic nucleation under room temperature electromigration.

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