TY - JOUR
T1 - Bandgap engineered ultraviolet photodetectors with gallium-zinc-oxide via co-sputtering method
AU - Yang, C. P.
AU - Chang, S. P.
AU - Chang, S. J.
AU - Chen, S. X.
AU - Hsu, M. H.
AU - Tung, W. J.
AU - Huang, W. L.
AU - Chang, T. H.
AU - Chiu, C. J.
AU - Weng, W. Y.
N1 - Funding Information:
This work was supported by the Ministry of Science and Technology [contract numbers MOST 106-2221-E-006-178 and MOST 105-2221-E-006-118]; the Center for Frontier Materials and Micro/Nano Science and Technology, National Cheng Kung University, Taiwan; and the Advanced Optoelectronic Technology Center, National Cheng Kung University, for projects from the Ministry of Education.
Funding Information:
This work was supported by the Ministry of Science and Technology [contract numbers MOST 106-2221-E-006-178 and MOST 105-2221-E-006-118]; the Center for Frontier Materials and Micro/Nano Science and Technology, National Cheng Kung University, Taiwan; and the Advanced Optoelectronic Technology Center, National Cheng Kung University, for projects from the Ministry of Education
Publisher Copyright:
© The Author(s) 2018. Published by ECS.
PY - 2018
Y1 - 2018
N2 - The authors report the fabrication of gallium-zinc-oxide (GZO)MSM ultraviolet photodetectors (PDs) via co-sputtering using Ga2O3 and ZnO targets. The cutoff wavelength of the fabricated PDs is changed by adjusting the radio frequency power of the ZnO target during the co-sputtering procedure. The GZO thin films are investigated via physical analysis, such as atomic force microscopy, absorption coefficient spectroscopy, and X-ray photoelectron spectroscopy. The results indicate that the smooth GZO thin films are composed of a wide-gap semiconductor and a clearly n-type material. With a 10-V applied bias, the corresponding IPhoto/IDark ratios for three devices labeled A, B, and C are 1.4 × 103, 9.3 × 102, and 2.7 × 103, respectively. Under corresponding cutoff wavelengths with a 0.2-V applied bias, the responsivity values are 2.7 × 10-6, 9 × 10-6, and 1.5 × 10-4 for devices A, B, and C, respectively. Thus, these GZO ultraviolet PDs not only have a simple and low-cost fabrication process but also are suitable for ultraviolet sensing application owing to their outstanding electro-optical properties.
AB - The authors report the fabrication of gallium-zinc-oxide (GZO)MSM ultraviolet photodetectors (PDs) via co-sputtering using Ga2O3 and ZnO targets. The cutoff wavelength of the fabricated PDs is changed by adjusting the radio frequency power of the ZnO target during the co-sputtering procedure. The GZO thin films are investigated via physical analysis, such as atomic force microscopy, absorption coefficient spectroscopy, and X-ray photoelectron spectroscopy. The results indicate that the smooth GZO thin films are composed of a wide-gap semiconductor and a clearly n-type material. With a 10-V applied bias, the corresponding IPhoto/IDark ratios for three devices labeled A, B, and C are 1.4 × 103, 9.3 × 102, and 2.7 × 103, respectively. Under corresponding cutoff wavelengths with a 0.2-V applied bias, the responsivity values are 2.7 × 10-6, 9 × 10-6, and 1.5 × 10-4 for devices A, B, and C, respectively. Thus, these GZO ultraviolet PDs not only have a simple and low-cost fabrication process but also are suitable for ultraviolet sensing application owing to their outstanding electro-optical properties.
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U2 - 10.1149/2.0151807jss
DO - 10.1149/2.0151807jss
M3 - Article
AN - SCOPUS:85051378899
VL - 7
SP - Q3083-Q3088
JO - ECS Journal of Solid State Science and Technology
JF - ECS Journal of Solid State Science and Technology
SN - 2162-8769
IS - 7
ER -