TY - JOUR
T1 - Carbon-based molecular sieve membranes for gas separation by inductively-coupled-plasma chemical vapor deposition
AU - Wang, Liang Jun
AU - Hong, Franklin Chau Nan
N1 - Funding Information:
The financial support of this work by the National Science Council of the Republic of China, under project # NSC 93-2214-E-006-001, and Center for Micro-Nano Technology, National Cheng-Kung University is gratefully acknowledged.
PY - 2005/1/26
Y1 - 2005/1/26
N2 - Carbon-based molecular sieve (CMS) films for gas separation have been deposited on porous Al2O3 disks using hexamethyldisiloxane (HMDSO) by a remote inductively-coupled-plasma (ICP) chemical vapor deposition (CVD) method. The H2/N2 selectivities of the as-deposited films failed into the range of 5-10, higher than the Knudsen diffusion selectivity, 3.7. After pyrolysis of the as-deposited film at 873 K, the permeance increased by one order of magnitude with no significant change of the selectivity. A surface treatment method was further employed by bombarding the as-deposited film with high energy ions of HMDSO. After pyrolysis at 823 K, the surface-treated film exhibits a very significant increase of H 2/N2 selectivity without any reduction of the permeance. The H2/N2 selectivity could reach 30-45 with an extremely high permeance around 2 × 10-6 molm-2s -1Pa-1 at 423 K. The O2/N2 selectivity reached 3.8 and the O2 permeance was about 2 × 10-7molm-2s-1Pa-1 at 298 K. Therefore, a new method for preparing carbon-based molecular sieve membranes has been introduced by combining the surface treatment with high energy ion bombardment and the subsequent high temperature pyrolysis.
AB - Carbon-based molecular sieve (CMS) films for gas separation have been deposited on porous Al2O3 disks using hexamethyldisiloxane (HMDSO) by a remote inductively-coupled-plasma (ICP) chemical vapor deposition (CVD) method. The H2/N2 selectivities of the as-deposited films failed into the range of 5-10, higher than the Knudsen diffusion selectivity, 3.7. After pyrolysis of the as-deposited film at 873 K, the permeance increased by one order of magnitude with no significant change of the selectivity. A surface treatment method was further employed by bombarding the as-deposited film with high energy ions of HMDSO. After pyrolysis at 823 K, the surface-treated film exhibits a very significant increase of H 2/N2 selectivity without any reduction of the permeance. The H2/N2 selectivity could reach 30-45 with an extremely high permeance around 2 × 10-6 molm-2s -1Pa-1 at 423 K. The O2/N2 selectivity reached 3.8 and the O2 permeance was about 2 × 10-7molm-2s-1Pa-1 at 298 K. Therefore, a new method for preparing carbon-based molecular sieve membranes has been introduced by combining the surface treatment with high energy ion bombardment and the subsequent high temperature pyrolysis.
UR - http://www.scopus.com/inward/record.url?scp=11244304779&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=11244304779&partnerID=8YFLogxK
U2 - 10.1016/j.micromeso.2004.09.001
DO - 10.1016/j.micromeso.2004.09.001
M3 - Article
AN - SCOPUS:11244304779
VL - 77
SP - 167
EP - 174
JO - Zeolites
JF - Zeolites
SN - 1387-1811
IS - 2-3
ER -