Characteristics of mesa- and air-type In0.5Al 0.5As/In0.5Ga0.5As metamorphic HEMTs with or without a buried gate

M. K. Hsu, H. R. Chen, S. Y. Chiu, W. T. Chen, Wen-Chau Liu, J. H. Tasi, W. S. Lour

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5 Citations (Scopus)

Abstract

Depletion-mode δ-doped In0.5Ga0.5As/In 0.5Al0.5As mHEMTs have been metamorphically grown on a GaAs substrate and successfully fabricated with different kinds of gate-metal formation. The gate-metal formations include a combination of mesa- or air-type gate feeder with or without a buried gate (before or after annealing). Only the air-type mHEMT with a buried gate shows no clear kink-effect behaviour. For a 1 νm gate mesa-type (air-type) mHEMT, a maximum extrinsic transconductance of 412 (414) and 535 (472) mS mm-1 is obtained before annealing and after annealing. There is a 207 mV (205 mV) shift in VTH after the mesa-type (air-type) mHEMT is annealed. Experimental results indicate that both the gate-feeder metal and the annealing process have a significant effect on output conductance, gate leakage current, breakdown voltage, high frequency and noise performances. The peak gate leakage current density of 12 (120) νA mm-1 for the air-type (mesa-type) mHEMT before annealing is improved to 8 (55) νA mm-1 after annealing. At 2.4 (5.4) GHz, gain ≤ 23 (20) dB can be obtained at Fmin ≤ 1.27 (1.76) dB for the air-type mHEMT after annealing, while gain ≤ 22 (18.5) dB is obtained at F min ≤ 1.36 (2.0) dB before annealing. For the mesa-type mHEMT, these values are gain ≤ 20 (16.5) dB at Fmin ≤ 1.47 (2.25) dB and gain ≤ 19.5 (14) dB at Fmin ≤ 1.68 (3.11) dB.

Original languageEnglish
Article number007
Pages (from-to)35-42
Number of pages8
JournalSemiconductor Science and Technology
Volume22
Issue number2
DOIs
Publication statusPublished - 2007 Feb 1

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)
  • Condensed Matter Physics

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