Characteristics of TiNi alloy thin films

Peter Chen; Jyh Ming Ting

doi:10.1016/S0040-6090(01)01325-6

Characteristics of TiNi alloy thin films

Peter Chen, Jyh Ming Ting

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

Deposition and characterization of TiNi shape memory alloy thin films were performed using a DC magnetron sputter deposition technique. As-deposited TiNi thin films were found to exhibit an amorphous structure, which crystallized upon heat treatment at 550 or 600°C. An uncommon dependence of the deposition rate on the deposition pressure was observed. Dependence of composition on the deposition pressure was also determined. The crystallization behavior of amorphous TiNi thin films was found to be different from that of bulk TiNi. The activation energies for the crystallization of the resulting TiNi thin films were calculated and found to be higher than that of bulk TiNi.

Original language	English
Pages (from-to)	597-601
Number of pages	5
Journal	Thin Solid Films
Volume	398
Issue number	399
DOIs	https://doi.org/10.1016/S0040-6090(01)01325-6
Publication status	Published - 2001 Nov

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/S0040-6090(01)01325-6

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title = "Characteristics of TiNi alloy thin films",

abstract = "Deposition and characterization of TiNi shape memory alloy thin films were performed using a DC magnetron sputter deposition technique. As-deposited TiNi thin films were found to exhibit an amorphous structure, which crystallized upon heat treatment at 550 or 600°C. An uncommon dependence of the deposition rate on the deposition pressure was observed. Dependence of composition on the deposition pressure was also determined. The crystallization behavior of amorphous TiNi thin films was found to be different from that of bulk TiNi. The activation energies for the crystallization of the resulting TiNi thin films were calculated and found to be higher than that of bulk TiNi.",

author = "Peter Chen and Ting, {Jyh Ming}",

note = "Funding Information: This study was supported by the National Health Research Institute under Contract No. NHRI GT-EX89E931C. The authors also thank Prof. C.J. Chen at the Department of Chemical Engineering, National Cheng Kung University, Taiwan for use of DCS equipment. Dr C. Tang at Applied Sciences, Inc., Ohio, USA, performed EPMA analysis on selected specimens.",

year = "2001",

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T1 - Characteristics of TiNi alloy thin films

AU - Chen, Peter

AU - Ting, Jyh Ming

N1 - Funding Information: This study was supported by the National Health Research Institute under Contract No. NHRI GT-EX89E931C. The authors also thank Prof. C.J. Chen at the Department of Chemical Engineering, National Cheng Kung University, Taiwan for use of DCS equipment. Dr C. Tang at Applied Sciences, Inc., Ohio, USA, performed EPMA analysis on selected specimens.

PY - 2001/11

Y1 - 2001/11

N2 - Deposition and characterization of TiNi shape memory alloy thin films were performed using a DC magnetron sputter deposition technique. As-deposited TiNi thin films were found to exhibit an amorphous structure, which crystallized upon heat treatment at 550 or 600°C. An uncommon dependence of the deposition rate on the deposition pressure was observed. Dependence of composition on the deposition pressure was also determined. The crystallization behavior of amorphous TiNi thin films was found to be different from that of bulk TiNi. The activation energies for the crystallization of the resulting TiNi thin films were calculated and found to be higher than that of bulk TiNi.

AB - Deposition and characterization of TiNi shape memory alloy thin films were performed using a DC magnetron sputter deposition technique. As-deposited TiNi thin films were found to exhibit an amorphous structure, which crystallized upon heat treatment at 550 or 600°C. An uncommon dependence of the deposition rate on the deposition pressure was observed. Dependence of composition on the deposition pressure was also determined. The crystallization behavior of amorphous TiNi thin films was found to be different from that of bulk TiNi. The activation energies for the crystallization of the resulting TiNi thin films were calculated and found to be higher than that of bulk TiNi.

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ER -

Characteristics of TiNi alloy thin films

Abstract

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