Characteristics of zinc oxide deposited on copper metallized Si substrates

Y. S. Chang, Jyh-Ming Ting

Research output: Contribution to journalArticle

Abstract

A radio frequency sputter deposition technique was used to deposit ZnO on Si specimens with surface metallization of copper. An ion beam sputter deposition technique was employed for the copper metallization. Crystalline sizes of ZnO thin films were found to be sensitive to the deposition temperature and insensitive to the O2/Ar ratio.

Original languageEnglish
Pages (from-to)2142-2148
Number of pages7
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume19
Issue number5
DOIs
Publication statusPublished - 2001 Sep 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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