Characterization of air-exposure/activation cycles of porous Ti-Zr-V getter film using synchrotron radiation photoemission spectroscopy

Chien Cheng Li, Jow Lay Huang, Ran Jin Lin, Ding Fwu Lii, Chia Hao Chen, Li Chyong Chen, Kuei Hsien Chen

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Highly porous TiZrV films on (100) Si wafers were used to study the oxidation state of a film surface after three gas-adsorption/activation cycles using synchrotron radiation photoemission spectroscopy (SRPES). The oxidation state and composition of porous TiZrV film are highly affected by the present conditions of air-exposure/activation cycles. In the porous TiZrV films after activation treatment, the C content on the surface of the films gradually increased with increasing air-exposure/activation cycles. In the porous TiZrV film after air-exposure treatment, the O content on the surface of the films decreased with increasing of air-exposure/activation cycles. The concentration of Zr on the film surface increased with increasing of air-exposure/activation cycles. These results are caused by the formation of metal carbides on the film surface.

Original languageEnglish
Pages (from-to)3672-3676
Number of pages5
JournalThin Solid Films
Volume517
Issue number13
DOIs
Publication statusPublished - 2009 May 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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