Abstract
A photo-assisted one-step electrodeposition has been applied to help in forming smooth and dense CuInSe2 (CIS) films. The difference in surface morphology and crystalline quality between CIS films with and without photo-assistance has been investigated. In the photo-assisted electrodeposition process, a halogen lamp providing maximum light intensity at about 0.6 μm-1.0 μm was used as light source to be irradiated onto the surface of Mo-coated soda lime glass substrates. Electrodeposited CIS thin films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM) and Raman spectroscopy. SEM and AFM results show a smoother film with lower roughness by photo-assisted electrodeposition at lower deposition potential. From the XRD patterns, it was found that photo-assistance enhanced the crystalline quality, and the enhancement remained after annealing at 500 C for 120 s. The analysis of Raman spectra indicated a reduction in secondary phases after applying photo-assistance. These results suggested effects of photo-assistance including activating surface diffusion and growing high-crystalline quality films with reduced defects during electrodeposition.
Original language | English |
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Pages (from-to) | 343-347 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 535 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2013 May 15 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry