Characterization of subwavelength-scale marginal roughness from far-field irradiance

Jyh Long Chern, Shu Chun Chu

Research output: Chapter in Book/Report/Conference proceedingConference contribution


A constructed-aperture approach is proposed to measure marginal roughness by far-field irradiance. It is numerically shown that spatial profile could be retrieved with an error less than 3%, even its variation is in subwavelength scale.

Original languageEnglish
Title of host publicationFrontiers in Optics, FiO 2006
PublisherOptical Society of America
ISBN (Print)1557528187, 9781557528186
Publication statusPublished - 2006 Jan 1
EventFrontiers in Optics, FiO 2006 - Rochester, NY, United States
Duration: 2006 Oct 102006 Oct 10

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701


OtherFrontiers in Optics, FiO 2006
CountryUnited States
CityRochester, NY


All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Chern, J. L., & Chu, S. C. (2006). Characterization of subwavelength-scale marginal roughness from far-field irradiance. In Frontiers in Optics, FiO 2006 (Optics InfoBase Conference Papers). Optical Society of America.