Characterization of subwavelength-scale marginal roughness from far-field irradiance

Jyh Long Chern, Shu-Chun Chu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A constructed-aperture approach is proposed to measure marginal roughness by far-field irradiance. It is numerically shown that spatial profile could be retrieved with an error less than 3%, even its variation is in subwavelength scale.

Original languageEnglish
Title of host publicationOptical Fabrication and Testing, OFT 2006
PublisherOptical Society of America
ISBN (Print)1557528187, 9781557528186
Publication statusPublished - 2006
EventOptical Fabrication and Testing, OFT 2006 - Rochester, NY, United States
Duration: 2006 Oct 102006 Oct 10

Other

OtherOptical Fabrication and Testing, OFT 2006
CountryUnited States
CityRochester, NY
Period06-10-1006-10-10

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All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Chern, J. L., & Chu, S-C. (2006). Characterization of subwavelength-scale marginal roughness from far-field irradiance. In Optical Fabrication and Testing, OFT 2006 Optical Society of America.