Characterization of subwavelength-scale marginal roughness from far-field irradiance

Jyh Long Chern; Shu-Chun Chu

Characterization of subwavelength-scale marginal roughness from far-field irradiance

Department of Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A constructed-aperture approach is proposed to measure marginal roughness by far-field irradiance. It is numerically shown that spatial profile could be retrieved with an error less than 3%, even its variation is in subwavelength scale.

Original language	English
Title of host publication	Organic Photonics and Electronics, OPE 2006
Publisher	Optical Society of America
ISBN (Print)	1557528187, 9781557528186
Publication status	Published - 2006 Jan 1
Event	Organic Photonics and Electronics, OPE 2006 - Rochester, NY, United States Duration: 2006 Oct 10 → 2006 Oct 10

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Other

Other	Organic Photonics and Electronics, OPE 2006
Country/Territory	United States
City	Rochester, NY
Period	06-10-10 → 06-10-10

All Science Journal Classification (ASJC) codes

Instrumentation
Atomic and Molecular Physics, and Optics

Cite this

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title = "Characterization of subwavelength-scale marginal roughness from far-field irradiance",

abstract = "A constructed-aperture approach is proposed to measure marginal roughness by far-field irradiance. It is numerically shown that spatial profile could be retrieved with an error less than 3%, even its variation is in subwavelength scale.",

author = "Chern, {Jyh Long} and Shu-Chun Chu",

year = "2006",

month = jan,

day = "1",

language = "English",

isbn = "1557528187",

series = "Optics InfoBase Conference Papers",

publisher = "Optical Society of America",

booktitle = "Organic Photonics and Electronics, OPE 2006",

note = "Organic Photonics and Electronics, OPE 2006 ; Conference date: 10-10-2006 Through 10-10-2006",

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T1 - Characterization of subwavelength-scale marginal roughness from far-field irradiance

AU - Chern, Jyh Long

AU - Chu, Shu-Chun

PY - 2006/1/1

Y1 - 2006/1/1

N2 - A constructed-aperture approach is proposed to measure marginal roughness by far-field irradiance. It is numerically shown that spatial profile could be retrieved with an error less than 3%, even its variation is in subwavelength scale.

AB - A constructed-aperture approach is proposed to measure marginal roughness by far-field irradiance. It is numerically shown that spatial profile could be retrieved with an error less than 3%, even its variation is in subwavelength scale.

UR - http://www.scopus.com/inward/record.url?scp=84899136528&partnerID=8YFLogxK

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M3 - Conference contribution

AN - SCOPUS:84899136528

SN - 1557528187

SN - 9781557528186

T3 - Optics InfoBase Conference Papers

BT - Organic Photonics and Electronics, OPE 2006

PB - Optical Society of America

T2 - Organic Photonics and Electronics, OPE 2006

Y2 - 10 October 2006 through 10 October 2006

ER -

Characterization of subwavelength-scale marginal roughness from far-field irradiance

Abstract

Publication series

Other

All Science Journal Classification (ASJC) codes

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