Characterization of subwavelength-scale marginal roughness from far-field irradiance

Jyh Long Chern, Shu Chun Chu

Research output: Chapter in Book/Report/Conference proceedingConference contribution


A constructed-aperture approach is proposed to measure marginal roughness by far-field irradiance. It is numerically shown that spatial profile could be retrieved with an error less than 3%, even its variation is in subwavelength scale.

Original languageEnglish
Title of host publicationLaser Science, LS 2006
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)1557528187
Publication statusPublished - 2006
EventLaser Science, LS 2006 - Rochester, NY, United States
Duration: 2006 Oct 102006 Oct 10

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701


OtherLaser Science, LS 2006
Country/TerritoryUnited States
CityRochester, NY

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials


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