Chemical modification of the poly(vinylidene fluoride-trifluoroethylene) copolymer surface through fluorocarbon ion beam deposition

Wen-Dung Hsu, Inkook Jang, Susan B. Sinnott

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Classical molecular dynamics simulations are used to study the effects of continuous fluorocarbon ion beam deposition on a poly(vinylidene fluoride-trifluoroethylene) [P(VDF-trFE)] surface, a polymer with electromechanical properties. Fluorocarbon plasma processing is widely used to chemically modify surfaces and deposit thin films. It is well accepted that polyatomic ions and neutrals within low-energy plasmas have a significant effect on the surface chemistry induced by the plasma. The deposition of mass selected fluorocarbon ions is useful to isolate the effects specific to polyatomic ions. Here, the differences in the chemical interactions of C3 F5+ and C F3+ ions with the P(VDF-trFE) surface are examined. The incident energy of the ions in both beams is 50 eV. The C F3+ ions are predicted to be more effective at fluorinating the P(VDF-trFE) surface than C3 F5+ ions. At the same time, the C3 F5+ ions are predicted to be more effective at growing fluorocarbon thin films. The simulations also reveal how the deposition process might ultimately modify the electromechanical properties of this polymer surface.

Original languageEnglish
Pages (from-to)1084-1092
Number of pages9
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume25
Issue number4
DOIs
Publication statusPublished - 2007 Aug 2

Fingerprint

Fluorocarbons
fluorocarbons
Chemical modification
vinylidene
Ion beams
fluorides
copolymers
Copolymers
ion beams
Ions
ions
Polymers
Plasmas
Plasma applications
Thin films
vinylidene fluoride-trifluoroethylene copolymer
polyvinylidene fluoride
polymers
thin films
Surface chemistry

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

@article{8cb98143d8dc4a59937bbefefae15aa6,
title = "Chemical modification of the poly(vinylidene fluoride-trifluoroethylene) copolymer surface through fluorocarbon ion beam deposition",
abstract = "Classical molecular dynamics simulations are used to study the effects of continuous fluorocarbon ion beam deposition on a poly(vinylidene fluoride-trifluoroethylene) [P(VDF-trFE)] surface, a polymer with electromechanical properties. Fluorocarbon plasma processing is widely used to chemically modify surfaces and deposit thin films. It is well accepted that polyatomic ions and neutrals within low-energy plasmas have a significant effect on the surface chemistry induced by the plasma. The deposition of mass selected fluorocarbon ions is useful to isolate the effects specific to polyatomic ions. Here, the differences in the chemical interactions of C3 F5+ and C F3+ ions with the P(VDF-trFE) surface are examined. The incident energy of the ions in both beams is 50 eV. The C F3+ ions are predicted to be more effective at fluorinating the P(VDF-trFE) surface than C3 F5+ ions. At the same time, the C3 F5+ ions are predicted to be more effective at growing fluorocarbon thin films. The simulations also reveal how the deposition process might ultimately modify the electromechanical properties of this polymer surface.",
author = "Wen-Dung Hsu and Inkook Jang and Sinnott, {Susan B.}",
year = "2007",
month = "8",
day = "2",
doi = "10.1116/1.2721572",
language = "English",
volume = "25",
pages = "1084--1092",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "4",

}

TY - JOUR

T1 - Chemical modification of the poly(vinylidene fluoride-trifluoroethylene) copolymer surface through fluorocarbon ion beam deposition

AU - Hsu, Wen-Dung

AU - Jang, Inkook

AU - Sinnott, Susan B.

PY - 2007/8/2

Y1 - 2007/8/2

N2 - Classical molecular dynamics simulations are used to study the effects of continuous fluorocarbon ion beam deposition on a poly(vinylidene fluoride-trifluoroethylene) [P(VDF-trFE)] surface, a polymer with electromechanical properties. Fluorocarbon plasma processing is widely used to chemically modify surfaces and deposit thin films. It is well accepted that polyatomic ions and neutrals within low-energy plasmas have a significant effect on the surface chemistry induced by the plasma. The deposition of mass selected fluorocarbon ions is useful to isolate the effects specific to polyatomic ions. Here, the differences in the chemical interactions of C3 F5+ and C F3+ ions with the P(VDF-trFE) surface are examined. The incident energy of the ions in both beams is 50 eV. The C F3+ ions are predicted to be more effective at fluorinating the P(VDF-trFE) surface than C3 F5+ ions. At the same time, the C3 F5+ ions are predicted to be more effective at growing fluorocarbon thin films. The simulations also reveal how the deposition process might ultimately modify the electromechanical properties of this polymer surface.

AB - Classical molecular dynamics simulations are used to study the effects of continuous fluorocarbon ion beam deposition on a poly(vinylidene fluoride-trifluoroethylene) [P(VDF-trFE)] surface, a polymer with electromechanical properties. Fluorocarbon plasma processing is widely used to chemically modify surfaces and deposit thin films. It is well accepted that polyatomic ions and neutrals within low-energy plasmas have a significant effect on the surface chemistry induced by the plasma. The deposition of mass selected fluorocarbon ions is useful to isolate the effects specific to polyatomic ions. Here, the differences in the chemical interactions of C3 F5+ and C F3+ ions with the P(VDF-trFE) surface are examined. The incident energy of the ions in both beams is 50 eV. The C F3+ ions are predicted to be more effective at fluorinating the P(VDF-trFE) surface than C3 F5+ ions. At the same time, the C3 F5+ ions are predicted to be more effective at growing fluorocarbon thin films. The simulations also reveal how the deposition process might ultimately modify the electromechanical properties of this polymer surface.

UR - http://www.scopus.com/inward/record.url?scp=34547302041&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34547302041&partnerID=8YFLogxK

U2 - 10.1116/1.2721572

DO - 10.1116/1.2721572

M3 - Article

VL - 25

SP - 1084

EP - 1092

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 4

ER -