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Chemical oxide interfacial layer for the high-k-last/gate-last integration scheme
- Ying Tsung Chen
- , Ssu I. Fu
- , Wen Tai Chiang
- , Chien Ting Lin
- , Shih Hung Tsai
- , Shao Wei Wang
- , Shoou Jinn Chang
Research output: Contribution to journal › Article › peer-review
9
Citations
(Scopus)