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Chemical oxide interfacial layer for the high-k-last/gate-last integration scheme
Ying Tsung Chen, Ssu I. Fu, Wen Tai Chiang, Chien Ting Lin, Shih Hung Tsai, Shao Wei Wang, Shoou Jinn Chang
Research output: Contribution to journal › Article › peer-review
9
Citations
(Scopus)