Comparative study of self-assembling of multilayers using reactive sputter deposition and mass selective ion beam deposition

Wan Yu Wu, Jyh Ming Ting, Hayo Zutz, Dominika Lyzwa, Inga Gerhards, Carsten Ronning, Hans Hofsäss

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

While experimenting with the growth of metal-containing amorphous carbon (a-c:Me) thin films using two different growth processes, self-assembled multilayered structures were observed. One of the processes is a reactive magnetron sputter deposition process. The other process is a mass selective ion beam deposition process. Despite of the differences in the growth method and the growth condition, self-assembled multilayered thin films, consisting of alternating dark layer and bright layer, were obtained in both processes. Based on the consideration of energy for atomic diffusion in the thin films, the growth mechanism is discussed.

Original languageEnglish
Pages (from-to)1494-1497
Number of pages4
JournalDiamond and Related Materials
Volume17
Issue number7-10
DOIs
Publication statusPublished - 2008 Jul 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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