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Comparison of equivalent oxide thickness and electrical properties of atomic layer deposited hafnium zirconate dielectrics with thermal or decoupled plasma nitridation process

  • Chen Kuo Chiang
  • , Chien Hung Wu
  • , Chin Chien Liu
  • , Jin Fu Lin
  • , Chien Lun Yang
  • , Jiun Yuan Wu
  • , Shui Jinn Wang

Research output: Contribution to journal › Article › peer-review

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