Comparison of structure and electron-field-emission behavior of chemical-vapor-deposited diamond and pulsed-laser-deposited diamond-like carbon films

Hsiu Fung Cheng, Yi Chun Chen, Yin Ling Wang, Yuan Yu Chen, Bor Jau Tsau, Tang Chen, I. Nan Lin

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The correlation between the structure and the electron-field-emission behavior of chemical-vapor-deposited (CVD) diamond films and those of pulsed-laser-deposited (PLD) diamond-like carbon (DLC) films is investigated. The CVD films contain crystalline diamonds (sp3-bonds) separated from amorphous carbon (sp2-bonds), possessing a large electron-field-emission current density [(Je)CVD = 140 μA/cm2 at 21.6 V/μm], a low turn-on field [(E0)CVD = 10 V/μm] and a single-value effective work function [(φe)CVD = 0.082 eV]. In contrast, the pulsed-laser-deposited DLC films exhibit even better electron field emission properties [(Je)DLC = 320 μA/cm2 at 21.6 V/μm, (E0)DLC -8 V/μm] and a wide range of effective work functions [(φe)DLC = 0.016-0.031 eV]. The superior electron-field-emission properties of DLC films, as compared with those of CVD diamonds, are ascribed to their nanostructured grains, which contain a mixture of sp3-bonds and sp2-bonds.

Original languageEnglish
Pages (from-to)1866-1871
Number of pages6
JournalJapanese Journal of Applied Physics
Volume39
Issue number4 A
DOIs
Publication statusPublished - 2000

All Science Journal Classification (ASJC) codes

  • General Engineering
  • General Physics and Astronomy

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