Comparison of thermal stability and chemical bonding configurations of plasma oxynitrided Hf and Zr thin films

Yi Sheng Lai, C. H. Lu, Li Min Chen, J. S. Chen

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9 Citations (Scopus)

Abstract

In this work, we study the characteristics of plasma oxynitrided Hf and Zr thin films. A 5-nm-thick Hf or Zr metal film is deposited on the bare Si substrate, followed by plasma oxynitridation on these metal films in a N 2O or NH3 ambient. Incorporation of O and N leads to the formation of HfOxNy, and ZrOxNy films. The high nitrogen content in the HfOxNy films prepared by NH3 plasma oxynitridation is found to increase the onset of the crystallization temperature, as compared to films prepared by N 2O plasma oxynitridation. Nevertheless, the difference in crystallization temperature is not seen for ZrOxNy films. The interlayer (IL) between HfOxNy (or ZrO xNy) and Si is found to be thinner for the films with NH3 plasma oxynitridation than those with N2O plasma oxynitridation. However, the nitrogen incorporated by plasma oxynitridation appears to be depleted after rapid thermal oxidation annealing and is not effective to inhibit the growth of the IL. The activation energy of the IL growth for N2O and NH3 oxynitrided HfOxN y, is 0.23 and 0.13 eV, respectively. The activation energy of the IL growth for N2O and NH3 oxynitrided ZrOxN y is 0.19 and 0.14 eV, respectively.

Original languageEnglish
Pages (from-to)F146-F152
JournalJournal of the Electrochemical Society
Volume152
Issue number9
DOIs
Publication statusPublished - 2005 Oct 7

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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