Complete analysis of photoelastic fringe patterns using two wavelengths

T. Y. Chen; S. H. Tsao; H. L. Lee

doi:10.1117/12.468855

Complete analysis of photoelastic fringe patterns using two wavelengths

T. Y. Chen, S. H. Tsao, H. L. Lee

Department of Mechanical Engineering

Research output: Contribution to journal › Conference article › peer-review

2 Citations (Scopus)

Abstract

A new approach for whole-field digital determination of isoclinic angle and total isochromatic fringe order is presented. The method uses a plan polariscope with two different filters to calculate the photoelastic parameters, and to compensate the influence of the isochromatic fringes on the isoclinic pattern. The method allows for the determination of whole-field fringe orders without zero-order fringes.

Original language	English
Pages (from-to)	325-328
Number of pages	4
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4537
DOIs	https://doi.org/10.1117/12.468855
Publication status	Published - 2001
Event	3th Conference on Experimental Mechanics - Beijing, China Duration: 2001 Oct 15 → 2001 Oct 17

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.468855

Cite this

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title = "Complete analysis of photoelastic fringe patterns using two wavelengths",

abstract = "A new approach for whole-field digital determination of isoclinic angle and total isochromatic fringe order is presented. The method uses a plan polariscope with two different filters to calculate the photoelastic parameters, and to compensate the influence of the isochromatic fringes on the isoclinic pattern. The method allows for the determination of whole-field fringe orders without zero-order fringes.",

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AU - Chen, T. Y.

AU - Tsao, S. H.

AU - Lee, H. L.

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AB - A new approach for whole-field digital determination of isoclinic angle and total isochromatic fringe order is presented. The method uses a plan polariscope with two different filters to calculate the photoelastic parameters, and to compensate the influence of the isochromatic fringes on the isoclinic pattern. The method allows for the determination of whole-field fringe orders without zero-order fringes.

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DO - 10.1117/12.468855

M3 - Conference article

AN - SCOPUS:0035554893

SN - 0277-786X

VL - 4537

SP - 325

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - 3th Conference on Experimental Mechanics

Y2 - 15 October 2001 through 17 October 2001

ER -

Complete analysis of photoelastic fringe patterns using two wavelengths

Abstract

All Science Journal Classification (ASJC) codes

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