Completely preventing disclination lines occurred in LC lens array via an additionally whole photoresist film

Pin Hung Tang, Yen Jen Chang, Chia-Rong Sheu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A simple and effective method to prevent disclination lines in liquid crystal (LC) lens array is proposed. By means of an extra whole photoresist film coated on hole-patterned ITO (indium tin oxide) electrodes, there will be no disclination line when electrically operating LC lens arrays.

Original languageEnglish
Title of host publication22nd International Display Workshops, IDW 2015
PublisherInternational Display Workshops
Pages515-517
Number of pages3
ISBN (Electronic)9781510845503
Publication statusPublished - 2015 Jan 1
Event22nd International Display Workshops, IDW 2015 - Otsu, Japan
Duration: 2015 Dec 92015 Dec 11

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Other

Other22nd International Display Workshops, IDW 2015
Country/TerritoryJapan
CityOtsu
Period15-12-0915-12-11

All Science Journal Classification (ASJC) codes

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

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