Computer simulation of tension experiments of a thin film using an atomic model

Yeau-Ren Jeng, Chung Ming Tan

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)


The stress and strain induced in a very thin film under uniaxial tension are analyzed by an atomic-scale model approach that is based on the nonlinear finite element formulation. Certain aspects of the dependence of material properties on their size are addressed. This method is quasistatic, thereby greatly reducing required computation time. The numerical results show that the tension varies nonlinearly with the elongation and the stiffness of the thin film decreases with the decrease of the thickness. Evidence reveals that the variation of the distribution of the stress near the free surfaces is one of the causes of the decrease in the stiffness of the thin film.

Original languageEnglish
Article number174107
Pages (from-to)1741071-1741077
Number of pages7
JournalPhysical Review B - Condensed Matter and Materials Physics
Issue number17
Publication statusPublished - 2002 May 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


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