Converting SiO2 into crystalline Si for Si-based optoelectronics

Y. S. Tang; S. J. Cai; K. L. Wang

doi:10.1117/12.342792

Converting SiO₂ into crystalline Si for Si-based optoelectronics

Y. S. Tang, S. J. Cai, K. L. Wang

College of Electrical Engineering and Computer Science

Research output: Contribution to journal › Conference article › peer-review

Abstract

This paper reports a low cost method of converting SiO₂ or silica based into crystalline silicon by simple thermal annealing of Ti/Al coated SiO₂ or silica glass slides. The studies were performed using Raman scattering and x-ray diffraction. The results suggest that it is possible to extract reasonably good quality crystalline silicon from SiO₂ based substrates. This technique may have a wide range of applications in Si-based optoelectronics and other industry.

Original language	English
Pages (from-to)	207-211
Number of pages	5
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3630
DOIs	https://doi.org/10.1117/12.342792
Publication status	Published - 1999
Event	Proceedings of the 1999 Silicon-based Optoelectronics - San Jose, CA, USA Duration: 1999 Jan 27 → 1999 Jan 28

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.342792

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@article{37d4589c114e4f13b8415eafa607d40b,

title = "Converting SiO2 into crystalline Si for Si-based optoelectronics",

abstract = "This paper reports a low cost method of converting SiO2 or silica based into crystalline silicon by simple thermal annealing of Ti/Al coated SiO2 or silica glass slides. The studies were performed using Raman scattering and x-ray diffraction. The results suggest that it is possible to extract reasonably good quality crystalline silicon from SiO2 based substrates. This technique may have a wide range of applications in Si-based optoelectronics and other industry.",

author = "Tang, {Y. S.} and Cai, {S. J.} and Wang, {K. L.}",

year = "1999",

doi = "10.1117/12.342792",

language = "English",

volume = "3630",

pages = "207--211",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Proceedings of the 1999 Silicon-based Optoelectronics ; Conference date: 27-01-1999 Through 28-01-1999",

}

TY - JOUR

T1 - Converting SiO2 into crystalline Si for Si-based optoelectronics

AU - Tang, Y. S.

AU - Cai, S. J.

AU - Wang, K. L.

PY - 1999

Y1 - 1999

N2 - This paper reports a low cost method of converting SiO2 or silica based into crystalline silicon by simple thermal annealing of Ti/Al coated SiO2 or silica glass slides. The studies were performed using Raman scattering and x-ray diffraction. The results suggest that it is possible to extract reasonably good quality crystalline silicon from SiO2 based substrates. This technique may have a wide range of applications in Si-based optoelectronics and other industry.

AB - This paper reports a low cost method of converting SiO2 or silica based into crystalline silicon by simple thermal annealing of Ti/Al coated SiO2 or silica glass slides. The studies were performed using Raman scattering and x-ray diffraction. The results suggest that it is possible to extract reasonably good quality crystalline silicon from SiO2 based substrates. This technique may have a wide range of applications in Si-based optoelectronics and other industry.

UR - http://www.scopus.com/inward/record.url?scp=0033607957&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033607957&partnerID=8YFLogxK

U2 - 10.1117/12.342792

DO - 10.1117/12.342792

M3 - Conference article

AN - SCOPUS:0033607957

SN - 0277-786X

VL - 3630

SP - 207

EP - 211

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1999 Silicon-based Optoelectronics

Y2 - 27 January 1999 through 28 January 1999

ER -

Converting SiO₂ into crystalline Si for Si-based optoelectronics

Abstract

All Science Journal Classification (ASJC) codes

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