Converting SiO2 into crystalline Si for Si-based optoelectronics

Y. S. Tang, S. J. Cai, K. L. Wang

Research output: Contribution to journalConference articlepeer-review


This paper reports a low cost method of converting SiO2 or silica based into crystalline silicon by simple thermal annealing of Ti/Al coated SiO2 or silica glass slides. The studies were performed using Raman scattering and x-ray diffraction. The results suggest that it is possible to extract reasonably good quality crystalline silicon from SiO2 based substrates. This technique may have a wide range of applications in Si-based optoelectronics and other industry.

Original languageEnglish
Pages (from-to)207-211
Number of pages5
JournalProceedings of SPIE - The International Society for Optical Engineering
Publication statusPublished - 1999
EventProceedings of the 1999 Silicon-based Optoelectronics - San Jose, CA, USA
Duration: 1999 Jan 271999 Jan 28

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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