Copper diffusion barrier properties of a 10 nm W-Mo alloy films on porous SiOC:H

Kuo Chung Hsu, Dung Ching Perng, Jia Bin Yeh, Ruo Ping Chang, Jia Feng Fang, Climbing Huang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Fingerprint

Dive into the research topics of 'Copper diffusion barrier properties of a 10 nm W-Mo alloy films on porous SiOC:H'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science