Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

I. Ling Hsu; Fang Hao Yeh; Yu Cheng Chin; Chun In Cheung; Zi Chun Chia; Li Xing Yang; Ya Jyun Chen; Ting Yu Cheng; Shu Pao Wu; Pei Jane Tsai; Nan Yao Lee; Mei Yi Liao; Chih Chia Huang

doi:10.1016/j.cej.2021.131957

Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

I. Ling Hsu, Fang Hao Yeh, Yu Cheng Chin, Chun In Cheung, Zi Chun Chia, Li Xing Yang, Ya Jyun Chen, Ting Yu Cheng, Shu Pao Wu, Pei Jane Tsai, Nan Yao Lee, Mei Yi Liao, Chih Chia Huang

Research output: Contribution to journal › Comment/debate › peer-review

Abstract

In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.

Original language	English
Article number	131957
Journal	Chemical Engineering Journal
Volume	428
DOIs	https://doi.org/10.1016/j.cej.2021.131957
Publication status	Published - 2022 Jan 15

All Science Journal Classification (ASJC) codes

General Chemistry
Environmental Chemistry
General Chemical Engineering
Industrial and Manufacturing Engineering

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10.1016/j.cej.2021.131957

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Hsu, I. L., Yeh, F. H., Chin, Y. C., Cheung, C. I., Chia, Z. C., Yang, L. X., Chen, Y. J., Cheng, T. Y., Wu, S. P., Tsai, P. J., Lee, N. Y., Liao, M. Y., & Huang, C. C. (2022). Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). Chemical Engineering Journal, 428, Article 131957. https://doi.org/10.1016/j.cej.2021.131957

Hsu, I. Ling ; Yeh, Fang Hao ; Chin, Yu Cheng et al. / Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles : New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). In: Chemical Engineering Journal. 2022 ; Vol. 428.

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title = "Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))",

abstract = "In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.",

author = "Hsu, {I. Ling} and Yeh, {Fang Hao} and Chin, {Yu Cheng} and Cheung, {Chun In} and Chia, {Zi Chun} and Yang, {Li Xing} and Chen, {Ya Jyun} and Cheng, {Ting Yu} and Wu, {Shu Pao} and Tsai, {Pei Jane} and Lee, {Nan Yao} and Liao, {Mei Yi} and Huang, {Chih Chia}",

note = "Publisher Copyright: {\textcopyright} 2021 Elsevier B.V.",

year = "2022",

month = jan,

day = "15",

doi = "10.1016/j.cej.2021.131957",

language = "English",

volume = "428",

journal = "Chemical Engineering Journal",

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Hsu, IL, Yeh, FH, Chin, YC, Cheung, CI, Chia, ZC, Yang, LX, Chen, YJ, Cheng, TY, Wu, SP, Tsai, PJ , Lee, NY, Liao, MY & Huang, CC 2022, 'Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))', Chemical Engineering Journal, vol. 428, 131957. https://doi.org/10.1016/j.cej.2021.131957

Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). / Hsu, I. Ling; Yeh, Fang Hao; Chin, Yu Cheng et al.
In: Chemical Engineering Journal, Vol. 428, 131957, 15.01.2022.

Research output: Contribution to journal › Comment/debate › peer-review

TY - JOUR

T1 - Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles

T2 - New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

AU - Hsu, I. Ling

AU - Yeh, Fang Hao

AU - Chin, Yu Cheng

AU - Cheung, Chun In

AU - Chia, Zi Chun

AU - Yang, Li Xing

AU - Chen, Ya Jyun

AU - Cheng, Ting Yu

AU - Wu, Shu Pao

AU - Tsai, Pei Jane

AU - Lee, Nan Yao

AU - Liao, Mei Yi

AU - Huang, Chih Chia

PY - 2022/1/15

Y1 - 2022/1/15

N2 - In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.

AB - In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.

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DO - 10.1016/j.cej.2021.131957

M3 - Comment/debate

AN - SCOPUS:85114183518

SN - 1385-8947

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JO - Chemical Engineering Journal

JF - Chemical Engineering Journal

M1 - 131957

ER -

Hsu IL, Yeh FH, Chin YC, Cheung CI, Chia ZC, Yang LX et al. Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). Chemical Engineering Journal. 2022 Jan 15;428:131957. doi: 10.1016/j.cej.2021.131957

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