Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

I. Ling Hsu, Fang Hao Yeh, Yu Cheng Chin, Chun In Cheung, Zi Chun Chia, Li Xing Yang, Ya Jyun Chen, Ting Yu Cheng, Shu Pao Wu, Pei Jane Tsai, Nan Yao Lee, Mei Yi Liao, Chih Chia Huang

Research output: Contribution to journal › Comment/debate › peer-review

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