Dependence of compositions and crystallization behaviors of dc-sputtered TiNi thin films on the deposition conditions

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Abstract

The dependence of tin concentrations and crystallization behaviour of various tin-nickel thin film alloys on the processing conditions were investigated. The activation energies of tin-nickel thin films with three compositions were determined using Kissinger method. It was found that for higher dc power, tin at % was higher if the pressures were less than 20 m Torr, or else tin at % was lower if pressures were greater than or equal to 20 m Torr. The deposition rate was found to increase with the working distance and pressure and the activation energy examined was found to differ from that of bulk materials.

Original languageEnglish
Pages (from-to)2382-2387
Number of pages6
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume19
Issue number5
DOIs
Publication statusPublished - 2001 Jan 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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