Deposition and characteristics of iron-silicon thin film catalyst for CNT growth

Jyh Ming Ting, Shih Wei Hung

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

Fe-Si catalyst thin films for the growth of carbon nanotubes were prepared using co-sputter deposition. As-deposited Fe-Si films consist of different amounts of α-Fe and amorphous Si. The amount depends on the Si concentration in the film. Hydrogen plasma etched Fe-Si films become particles having different sizes. The particle size is also dependent on the Si concentration. Correlation among the Si concentration, the particle size, and the growth rate of carbon nanotube was made. Optimal growth of carbon nanotubes at 370 °C was obtained at an average particle size of 45 nm or a Si concentration of 21%.

Original languageEnglish
Pages (from-to)1834-1838
Number of pages5
JournalDiamond and Related Materials
Volume15
Issue number11-12 SPEC. ISS.
DOIs
Publication statusPublished - 2006 Nov 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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