Abstract
This UV LED lighting technology developed in this study is expected to be applied to photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of free-curved lens for light source element of UV LED for exposure machines. In this study, the optical intensity distributions of the lens with TFMG were determined by using commercial optical simulation FRED software. Based on the design, the lenses were fabricated using thermoforming of optical glass and PMMA, respectively. Then the lens is selectively coated with thin film metallic glasses (TFMG, Ag30 Mg45 Al25). For the TFMG coating, multi-target sputtering system is applied to sputter TFMG reflecting film on the surface of lens with thickness of 100 nm to 300 nm. With the both design of TFMG selective deposition and lens curve, the optical field of Lambertian emission patterns of UV LED can be transformed to uniform profile. Through this design of reflection of UV LED light source, the intensity and uniformity could be enhanced. UV LED light source with 360 to 390 nm in wavelength was chosen as light source to simulate the effects of I-line and G-line. The specific wavelength of UV light is measured by spectrometer (USB2000+VIS-NIR, Ocean Optics) and BM7.
| Original language | English |
|---|---|
| Title of host publication | 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 477-480 |
| Number of pages | 4 |
| ISBN (Electronic) | 9781479947270 |
| DOIs | |
| Publication status | Published - 2014 Sep 23 |
| Event | 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 - Waikiki Beach, United States Duration: 2014 Apr 13 → 2014 Apr 16 |
Publication series
| Name | 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 |
|---|
Other
| Other | 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 |
|---|---|
| Country | United States |
| City | Waikiki Beach |
| Period | 14-04-13 → 14-04-16 |
Fingerprint
All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Electrical and Electronic Engineering
Cite this
}
Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED. / Lin, P. H.; Pan, C. T.; Chen, Y. C.; Hsu, F. T.; Lin, P. H.; Shen, S. C.; Huang, J. C.; Chang, C. M.
9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc., 2014. p. 477-480 6908853 (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED
AU - Lin, P. H.
AU - Pan, C. T.
AU - Chen, Y. C.
AU - Hsu, F. T.
AU - Lin, P. H.
AU - Shen, S. C.
AU - Huang, J. C.
AU - Chang, C. M.
PY - 2014/9/23
Y1 - 2014/9/23
N2 - This UV LED lighting technology developed in this study is expected to be applied to photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of free-curved lens for light source element of UV LED for exposure machines. In this study, the optical intensity distributions of the lens with TFMG were determined by using commercial optical simulation FRED software. Based on the design, the lenses were fabricated using thermoforming of optical glass and PMMA, respectively. Then the lens is selectively coated with thin film metallic glasses (TFMG, Ag30 Mg45 Al25). For the TFMG coating, multi-target sputtering system is applied to sputter TFMG reflecting film on the surface of lens with thickness of 100 nm to 300 nm. With the both design of TFMG selective deposition and lens curve, the optical field of Lambertian emission patterns of UV LED can be transformed to uniform profile. Through this design of reflection of UV LED light source, the intensity and uniformity could be enhanced. UV LED light source with 360 to 390 nm in wavelength was chosen as light source to simulate the effects of I-line and G-line. The specific wavelength of UV light is measured by spectrometer (USB2000+VIS-NIR, Ocean Optics) and BM7.
AB - This UV LED lighting technology developed in this study is expected to be applied to photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of free-curved lens for light source element of UV LED for exposure machines. In this study, the optical intensity distributions of the lens with TFMG were determined by using commercial optical simulation FRED software. Based on the design, the lenses were fabricated using thermoforming of optical glass and PMMA, respectively. Then the lens is selectively coated with thin film metallic glasses (TFMG, Ag30 Mg45 Al25). For the TFMG coating, multi-target sputtering system is applied to sputter TFMG reflecting film on the surface of lens with thickness of 100 nm to 300 nm. With the both design of TFMG selective deposition and lens curve, the optical field of Lambertian emission patterns of UV LED can be transformed to uniform profile. Through this design of reflection of UV LED light source, the intensity and uniformity could be enhanced. UV LED light source with 360 to 390 nm in wavelength was chosen as light source to simulate the effects of I-line and G-line. The specific wavelength of UV light is measured by spectrometer (USB2000+VIS-NIR, Ocean Optics) and BM7.
UR - http://www.scopus.com/inward/record.url?scp=84908637311&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84908637311&partnerID=8YFLogxK
U2 - 10.1109/NEMS.2014.6908853
DO - 10.1109/NEMS.2014.6908853
M3 - Conference contribution
AN - SCOPUS:84908637311
T3 - 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
SP - 477
EP - 480
BT - 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
PB - Institute of Electrical and Electronics Engineers Inc.
ER -