Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED

P. H. Lin; C. T. Pan; Y. C. Chen; F. T. Hsu; P. H. Lin; S. C. Shen; J. C. Huang; C. M. Chang

doi:10.1109/NEMS.2014.6908853

Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED

P. H. Lin, C. T. Pan, Y. C. Chen, F. T. Hsu, P. H. Lin, S. C. Shen, J. C. Huang, C. M. Chang

Department of Systems and Naval Mechatronic Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

This UV LED lighting technology developed in this study is expected to be applied to photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of free-curved lens for light source element of UV LED for exposure machines. In this study, the optical intensity distributions of the lens with TFMG were determined by using commercial optical simulation FRED software. Based on the design, the lenses were fabricated using thermoforming of optical glass and PMMA, respectively. Then the lens is selectively coated with thin film metallic glasses (TFMG, Ag₃₀ Mg₄₅ Al₂₅). For the TFMG coating, multi-target sputtering system is applied to sputter TFMG reflecting film on the surface of lens with thickness of 100 nm to 300 nm. With the both design of TFMG selective deposition and lens curve, the optical field of Lambertian emission patterns of UV LED can be transformed to uniform profile. Through this design of reflection of UV LED light source, the intensity and uniformity could be enhanced. UV LED light source with 360 to 390 nm in wavelength was chosen as light source to simulate the effects of I-line and G-line. The specific wavelength of UV light is measured by spectrometer (USB2000+VIS-NIR, Ocean Optics) and BM7.

Original language	English
Title of host publication	9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	477-480
Number of pages	4
ISBN (Electronic)	9781479947270
DOIs	https://doi.org/10.1109/NEMS.2014.6908853
Publication status	Published - 2014 Sep 23
Event	9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 - Waikiki Beach, United States Duration: 2014 Apr 13 → 2014 Apr 16

Publication series

Name	9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014

Other

Other	9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
Country	United States
City	Waikiki Beach
Period	14-04-13 → 14-04-16

All Science Journal Classification (ASJC) codes

Control and Systems Engineering
Electrical and Electronic Engineering

Access to Document

10.1109/NEMS.2014.6908853

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Lin, P. H., Pan, C. T., Chen, Y. C., Hsu, F. T., Lin, P. H., Shen, S. C., Huang, J. C., & Chang, C. M. (2014). Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED. In 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 (pp. 477-480). [6908853] (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/NEMS.2014.6908853

Lin, P. H. ; Pan, C. T. ; Chen, Y. C. ; Hsu, F. T. ; Lin, P. H. ; Shen, S. C. ; Huang, J. C. ; Chang, C. M. / Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED. 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc., 2014. pp. 477-480 (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014).

@inproceedings{584f8d0743784e43896e28e4b977bec6,

title = "Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED",

abstract = "This UV LED lighting technology developed in this study is expected to be applied to photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of free-curved lens for light source element of UV LED for exposure machines. In this study, the optical intensity distributions of the lens with TFMG were determined by using commercial optical simulation FRED software. Based on the design, the lenses were fabricated using thermoforming of optical glass and PMMA, respectively. Then the lens is selectively coated with thin film metallic glasses (TFMG, Ag30 Mg45 Al25). For the TFMG coating, multi-target sputtering system is applied to sputter TFMG reflecting film on the surface of lens with thickness of 100 nm to 300 nm. With the both design of TFMG selective deposition and lens curve, the optical field of Lambertian emission patterns of UV LED can be transformed to uniform profile. Through this design of reflection of UV LED light source, the intensity and uniformity could be enhanced. UV LED light source with 360 to 390 nm in wavelength was chosen as light source to simulate the effects of I-line and G-line. The specific wavelength of UV light is measured by spectrometer (USB2000+VIS-NIR, Ocean Optics) and BM7.",

author = "Lin, {P. H.} and Pan, {C. T.} and Chen, {Y. C.} and Hsu, {F. T.} and Lin, {P. H.} and Shen, {S. C.} and Huang, {J. C.} and Chang, {C. M.}",

year = "2014",

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doi = "10.1109/NEMS.2014.6908853",

language = "English",

series = "9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014",

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booktitle = "9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014",

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note = "9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 ; Conference date: 13-04-2014 Through 16-04-2014",

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Lin, PH, Pan, CT, Chen, YC, Hsu, FT, Lin, PH, Shen, SC, Huang, JC & Chang, CM 2014, Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED. in 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014., 6908853, 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014, Institute of Electrical and Electronics Engineers Inc., pp. 477-480, 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014, Waikiki Beach, United States, 14-04-13. https://doi.org/10.1109/NEMS.2014.6908853

Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED. / Lin, P. H.; Pan, C. T.; Chen, Y. C.; Hsu, F. T.; Lin, P. H.; Shen, S. C.; Huang, J. C.; Chang, C. M.

9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc., 2014. p. 477-480 6908853 (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED

AU - Lin, P. H.

AU - Pan, C. T.

AU - Chen, Y. C.

AU - Hsu, F. T.

AU - Lin, P. H.

AU - Shen, S. C.

AU - Huang, J. C.

AU - Chang, C. M.

PY - 2014/9/23

Y1 - 2014/9/23

N2 - This UV LED lighting technology developed in this study is expected to be applied to photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of free-curved lens for light source element of UV LED for exposure machines. In this study, the optical intensity distributions of the lens with TFMG were determined by using commercial optical simulation FRED software. Based on the design, the lenses were fabricated using thermoforming of optical glass and PMMA, respectively. Then the lens is selectively coated with thin film metallic glasses (TFMG, Ag30 Mg45 Al25). For the TFMG coating, multi-target sputtering system is applied to sputter TFMG reflecting film on the surface of lens with thickness of 100 nm to 300 nm. With the both design of TFMG selective deposition and lens curve, the optical field of Lambertian emission patterns of UV LED can be transformed to uniform profile. Through this design of reflection of UV LED light source, the intensity and uniformity could be enhanced. UV LED light source with 360 to 390 nm in wavelength was chosen as light source to simulate the effects of I-line and G-line. The specific wavelength of UV light is measured by spectrometer (USB2000+VIS-NIR, Ocean Optics) and BM7.

AB - This UV LED lighting technology developed in this study is expected to be applied to photolithography industry. Since the accuracy of the degree of cross linking and sidewall profile could be affected by intensity of UV light dosage, this research proposes optical design and fabrication of free-curved lens for light source element of UV LED for exposure machines. In this study, the optical intensity distributions of the lens with TFMG were determined by using commercial optical simulation FRED software. Based on the design, the lenses were fabricated using thermoforming of optical glass and PMMA, respectively. Then the lens is selectively coated with thin film metallic glasses (TFMG, Ag30 Mg45 Al25). For the TFMG coating, multi-target sputtering system is applied to sputter TFMG reflecting film on the surface of lens with thickness of 100 nm to 300 nm. With the both design of TFMG selective deposition and lens curve, the optical field of Lambertian emission patterns of UV LED can be transformed to uniform profile. Through this design of reflection of UV LED light source, the intensity and uniformity could be enhanced. UV LED light source with 360 to 390 nm in wavelength was chosen as light source to simulate the effects of I-line and G-line. The specific wavelength of UV light is measured by spectrometer (USB2000+VIS-NIR, Ocean Optics) and BM7.

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M3 - Conference contribution

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BT - 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014

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Lin PH, Pan CT, Chen YC, Hsu FT, Lin PH, Shen SC et al. Design and fabrication of lens selectively coated with TFMG for uniform intensity of UV LED. In 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc. 2014. p. 477-480. 6908853. (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014). https://doi.org/10.1109/NEMS.2014.6908853