TY - GEN
T1 - Design of selective emitter profiles for high efficiency solar cells under manufacturing technology constraints
AU - Tam, Andrew M.
AU - Huang, Ying Yuan
AU - Chen, Chia Wei
AU - Ok, Young Woo
AU - Rohatgi, Ajeet
N1 - Publisher Copyright:
© 2016 IEEE.
PY - 2016/11/18
Y1 - 2016/11/18
N2 - Fabrication and analysis of a 21% efficient baseline n-PERT cell in this paper revealed that its performance was limited by its large J0 values on the front and back side, highlighting the need for a bifacial structure with selective emitters to decrease J0. To determine the practical efficiency limit of such a cell, Sentaurus 2-D modeling was conducted using doping profiles previously reported for high efficiency cells. The maximum efficiency was calculated to be 22.7% with self-alignment of the contacts to the heavily doped regions. Modeling was then conducted to investigate the losses incurred from the required alignment tolerances associated with the heavily doped region and metal contacts made with today's large-scale manufacturing equipment. Through careful design of the selective emitter and back surface field doping profiles, we show that for 50 μm wide metal contacts screen printed on a 300 μm wide heavily doped region on a 10 Ω-cm base wafer with bulk lifetime of 3 ms, the loss can be decreased by 0.65%, with practical screen-printed cell efficiencies approaching 22.5%. Projected future technology improvements show efficiencies up to 23% are possible with this structure.
AB - Fabrication and analysis of a 21% efficient baseline n-PERT cell in this paper revealed that its performance was limited by its large J0 values on the front and back side, highlighting the need for a bifacial structure with selective emitters to decrease J0. To determine the practical efficiency limit of such a cell, Sentaurus 2-D modeling was conducted using doping profiles previously reported for high efficiency cells. The maximum efficiency was calculated to be 22.7% with self-alignment of the contacts to the heavily doped regions. Modeling was then conducted to investigate the losses incurred from the required alignment tolerances associated with the heavily doped region and metal contacts made with today's large-scale manufacturing equipment. Through careful design of the selective emitter and back surface field doping profiles, we show that for 50 μm wide metal contacts screen printed on a 300 μm wide heavily doped region on a 10 Ω-cm base wafer with bulk lifetime of 3 ms, the loss can be decreased by 0.65%, with practical screen-printed cell efficiencies approaching 22.5%. Projected future technology improvements show efficiencies up to 23% are possible with this structure.
UR - http://www.scopus.com/inward/record.url?scp=85003766081&partnerID=8YFLogxK
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U2 - 10.1109/PVSC.2016.7750102
DO - 10.1109/PVSC.2016.7750102
M3 - Conference contribution
AN - SCOPUS:85003766081
T3 - Conference Record of the IEEE Photovoltaic Specialists Conference
SP - 2525
EP - 2530
BT - 2016 IEEE 43rd Photovoltaic Specialists Conference, PVSC 2016
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 43rd IEEE Photovoltaic Specialists Conference, PVSC 2016
Y2 - 5 June 2016 through 10 June 2016
ER -