Abstract
Over the past few years, the virtual metrology (VM) technology has been proposed and developed and several VM related papers have been published. These proposed VM architectures are mainly applied for conjecturing single-stage or direct processing quality. However, the processing quality of some of manufacturing processes cannot be measured directly. Those single-stage VM architectures may not be applied to handle this indirect VM problem accurately. To properly handle this indirect VM problem, the paper proposes a dual-stage indirect VM architecture (DIVMA), which involves two process tools, to handle the indirect VM problem. In Stage I, the direct VM model of the fore-tool is established as usual, and then the indirect VM model of the rear-tool is built in Stage II that involves the Stage-I VM output. The concept of virtual cassette is also proposed in the paper. The chemical vapor deposition (CVD) process of a fifth generation TFT-LCD fab in Chi Mei Optoelectronics Corporation (CMO), Taiwan is adopted to test and compare the conjecture accuracy without and with the virtual cassette and the proposed DIVMA. Experimental results demonstrate that the virtual-cassette concept is valid for improving VM conjecturing accuracy; also this DIVMA is adequate for handling the indirect VM problem that has a coupling effect between those two subsequent tools.
| Original language | English |
|---|---|
| Title of host publication | 2010 IEEE International Conference on Robotics and Automation, ICRA 2010 |
| Pages | 2107-2112 |
| Number of pages | 6 |
| DOIs | |
| Publication status | Published - 2010 Aug 26 |
| Event | 2010 IEEE International Conference on Robotics and Automation, ICRA 2010 - Anchorage, AK, United States Duration: 2010 May 3 → 2010 May 7 |
Publication series
| Name | Proceedings - IEEE International Conference on Robotics and Automation |
|---|---|
| ISSN (Print) | 1050-4729 |
Other
| Other | 2010 IEEE International Conference on Robotics and Automation, ICRA 2010 |
|---|---|
| Country | United States |
| City | Anchorage, AK |
| Period | 10-05-03 → 10-05-07 |
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All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Software
- Artificial Intelligence
- Electrical and Electronic Engineering
Cite this
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Developing a dual-stage indirect virtual metrology architecture. / Tsai, Wen Huang; Cheng, Fan-Tien; Wu, Wei Ming; Lin, Tung Ho.
2010 IEEE International Conference on Robotics and Automation, ICRA 2010. 2010. p. 2107-2112 5509719 (Proceedings - IEEE International Conference on Robotics and Automation).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - Developing a dual-stage indirect virtual metrology architecture
AU - Tsai, Wen Huang
AU - Cheng, Fan-Tien
AU - Wu, Wei Ming
AU - Lin, Tung Ho
PY - 2010/8/26
Y1 - 2010/8/26
N2 - Over the past few years, the virtual metrology (VM) technology has been proposed and developed and several VM related papers have been published. These proposed VM architectures are mainly applied for conjecturing single-stage or direct processing quality. However, the processing quality of some of manufacturing processes cannot be measured directly. Those single-stage VM architectures may not be applied to handle this indirect VM problem accurately. To properly handle this indirect VM problem, the paper proposes a dual-stage indirect VM architecture (DIVMA), which involves two process tools, to handle the indirect VM problem. In Stage I, the direct VM model of the fore-tool is established as usual, and then the indirect VM model of the rear-tool is built in Stage II that involves the Stage-I VM output. The concept of virtual cassette is also proposed in the paper. The chemical vapor deposition (CVD) process of a fifth generation TFT-LCD fab in Chi Mei Optoelectronics Corporation (CMO), Taiwan is adopted to test and compare the conjecture accuracy without and with the virtual cassette and the proposed DIVMA. Experimental results demonstrate that the virtual-cassette concept is valid for improving VM conjecturing accuracy; also this DIVMA is adequate for handling the indirect VM problem that has a coupling effect between those two subsequent tools.
AB - Over the past few years, the virtual metrology (VM) technology has been proposed and developed and several VM related papers have been published. These proposed VM architectures are mainly applied for conjecturing single-stage or direct processing quality. However, the processing quality of some of manufacturing processes cannot be measured directly. Those single-stage VM architectures may not be applied to handle this indirect VM problem accurately. To properly handle this indirect VM problem, the paper proposes a dual-stage indirect VM architecture (DIVMA), which involves two process tools, to handle the indirect VM problem. In Stage I, the direct VM model of the fore-tool is established as usual, and then the indirect VM model of the rear-tool is built in Stage II that involves the Stage-I VM output. The concept of virtual cassette is also proposed in the paper. The chemical vapor deposition (CVD) process of a fifth generation TFT-LCD fab in Chi Mei Optoelectronics Corporation (CMO), Taiwan is adopted to test and compare the conjecture accuracy without and with the virtual cassette and the proposed DIVMA. Experimental results demonstrate that the virtual-cassette concept is valid for improving VM conjecturing accuracy; also this DIVMA is adequate for handling the indirect VM problem that has a coupling effect between those two subsequent tools.
UR - http://www.scopus.com/inward/record.url?scp=77955834441&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77955834441&partnerID=8YFLogxK
U2 - 10.1109/ROBOT.2010.5509719
DO - 10.1109/ROBOT.2010.5509719
M3 - Conference contribution
SN - 9781424450381
T3 - Proceedings - IEEE International Conference on Robotics and Automation
SP - 2107
EP - 2112
BT - 2010 IEEE International Conference on Robotics and Automation, ICRA 2010
ER -