Developing a dual-stage indirect virtual metrology architecture

Wen Huang Tsai, Fan-Tien Cheng, Wei Ming Wu, Tung Ho Lin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Over the past few years, the virtual metrology (VM) technology has been proposed and developed and several VM related papers have been published. These proposed VM architectures are mainly applied for conjecturing single-stage or direct processing quality. However, the processing quality of some of manufacturing processes cannot be measured directly. Those single-stage VM architectures may not be applied to handle this indirect VM problem accurately. To properly handle this indirect VM problem, the paper proposes a dual-stage indirect VM architecture (DIVMA), which involves two process tools, to handle the indirect VM problem. In Stage I, the direct VM model of the fore-tool is established as usual, and then the indirect VM model of the rear-tool is built in Stage II that involves the Stage-I VM output. The concept of virtual cassette is also proposed in the paper. The chemical vapor deposition (CVD) process of a fifth generation TFT-LCD fab in Chi Mei Optoelectronics Corporation (CMO), Taiwan is adopted to test and compare the conjecture accuracy without and with the virtual cassette and the proposed DIVMA. Experimental results demonstrate that the virtual-cassette concept is valid for improving VM conjecturing accuracy; also this DIVMA is adequate for handling the indirect VM problem that has a coupling effect between those two subsequent tools.

Original languageEnglish
Title of host publication2010 IEEE International Conference on Robotics and Automation, ICRA 2010
Pages2107-2112
Number of pages6
DOIs
Publication statusPublished - 2010 Aug 26
Event2010 IEEE International Conference on Robotics and Automation, ICRA 2010 - Anchorage, AK, United States
Duration: 2010 May 32010 May 7

Publication series

NameProceedings - IEEE International Conference on Robotics and Automation
ISSN (Print)1050-4729

Other

Other2010 IEEE International Conference on Robotics and Automation, ICRA 2010
CountryUnited States
CityAnchorage, AK
Period10-05-0310-05-07

Fingerprint

Processing
Liquid crystal displays
Optoelectronic devices
Chemical vapor deposition
Industry

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Software
  • Artificial Intelligence
  • Electrical and Electronic Engineering

Cite this

Tsai, W. H., Cheng, F-T., Wu, W. M., & Lin, T. H. (2010). Developing a dual-stage indirect virtual metrology architecture. In 2010 IEEE International Conference on Robotics and Automation, ICRA 2010 (pp. 2107-2112). [5509719] (Proceedings - IEEE International Conference on Robotics and Automation). https://doi.org/10.1109/ROBOT.2010.5509719
Tsai, Wen Huang ; Cheng, Fan-Tien ; Wu, Wei Ming ; Lin, Tung Ho. / Developing a dual-stage indirect virtual metrology architecture. 2010 IEEE International Conference on Robotics and Automation, ICRA 2010. 2010. pp. 2107-2112 (Proceedings - IEEE International Conference on Robotics and Automation).
@inproceedings{f75ec19770e646e1b7802df4703e18bb,
title = "Developing a dual-stage indirect virtual metrology architecture",
abstract = "Over the past few years, the virtual metrology (VM) technology has been proposed and developed and several VM related papers have been published. These proposed VM architectures are mainly applied for conjecturing single-stage or direct processing quality. However, the processing quality of some of manufacturing processes cannot be measured directly. Those single-stage VM architectures may not be applied to handle this indirect VM problem accurately. To properly handle this indirect VM problem, the paper proposes a dual-stage indirect VM architecture (DIVMA), which involves two process tools, to handle the indirect VM problem. In Stage I, the direct VM model of the fore-tool is established as usual, and then the indirect VM model of the rear-tool is built in Stage II that involves the Stage-I VM output. The concept of virtual cassette is also proposed in the paper. The chemical vapor deposition (CVD) process of a fifth generation TFT-LCD fab in Chi Mei Optoelectronics Corporation (CMO), Taiwan is adopted to test and compare the conjecture accuracy without and with the virtual cassette and the proposed DIVMA. Experimental results demonstrate that the virtual-cassette concept is valid for improving VM conjecturing accuracy; also this DIVMA is adequate for handling the indirect VM problem that has a coupling effect between those two subsequent tools.",
author = "Tsai, {Wen Huang} and Fan-Tien Cheng and Wu, {Wei Ming} and Lin, {Tung Ho}",
year = "2010",
month = "8",
day = "26",
doi = "10.1109/ROBOT.2010.5509719",
language = "English",
isbn = "9781424450381",
series = "Proceedings - IEEE International Conference on Robotics and Automation",
pages = "2107--2112",
booktitle = "2010 IEEE International Conference on Robotics and Automation, ICRA 2010",

}

Tsai, WH, Cheng, F-T, Wu, WM & Lin, TH 2010, Developing a dual-stage indirect virtual metrology architecture. in 2010 IEEE International Conference on Robotics and Automation, ICRA 2010., 5509719, Proceedings - IEEE International Conference on Robotics and Automation, pp. 2107-2112, 2010 IEEE International Conference on Robotics and Automation, ICRA 2010, Anchorage, AK, United States, 10-05-03. https://doi.org/10.1109/ROBOT.2010.5509719

Developing a dual-stage indirect virtual metrology architecture. / Tsai, Wen Huang; Cheng, Fan-Tien; Wu, Wei Ming; Lin, Tung Ho.

2010 IEEE International Conference on Robotics and Automation, ICRA 2010. 2010. p. 2107-2112 5509719 (Proceedings - IEEE International Conference on Robotics and Automation).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Developing a dual-stage indirect virtual metrology architecture

AU - Tsai, Wen Huang

AU - Cheng, Fan-Tien

AU - Wu, Wei Ming

AU - Lin, Tung Ho

PY - 2010/8/26

Y1 - 2010/8/26

N2 - Over the past few years, the virtual metrology (VM) technology has been proposed and developed and several VM related papers have been published. These proposed VM architectures are mainly applied for conjecturing single-stage or direct processing quality. However, the processing quality of some of manufacturing processes cannot be measured directly. Those single-stage VM architectures may not be applied to handle this indirect VM problem accurately. To properly handle this indirect VM problem, the paper proposes a dual-stage indirect VM architecture (DIVMA), which involves two process tools, to handle the indirect VM problem. In Stage I, the direct VM model of the fore-tool is established as usual, and then the indirect VM model of the rear-tool is built in Stage II that involves the Stage-I VM output. The concept of virtual cassette is also proposed in the paper. The chemical vapor deposition (CVD) process of a fifth generation TFT-LCD fab in Chi Mei Optoelectronics Corporation (CMO), Taiwan is adopted to test and compare the conjecture accuracy without and with the virtual cassette and the proposed DIVMA. Experimental results demonstrate that the virtual-cassette concept is valid for improving VM conjecturing accuracy; also this DIVMA is adequate for handling the indirect VM problem that has a coupling effect between those two subsequent tools.

AB - Over the past few years, the virtual metrology (VM) technology has been proposed and developed and several VM related papers have been published. These proposed VM architectures are mainly applied for conjecturing single-stage or direct processing quality. However, the processing quality of some of manufacturing processes cannot be measured directly. Those single-stage VM architectures may not be applied to handle this indirect VM problem accurately. To properly handle this indirect VM problem, the paper proposes a dual-stage indirect VM architecture (DIVMA), which involves two process tools, to handle the indirect VM problem. In Stage I, the direct VM model of the fore-tool is established as usual, and then the indirect VM model of the rear-tool is built in Stage II that involves the Stage-I VM output. The concept of virtual cassette is also proposed in the paper. The chemical vapor deposition (CVD) process of a fifth generation TFT-LCD fab in Chi Mei Optoelectronics Corporation (CMO), Taiwan is adopted to test and compare the conjecture accuracy without and with the virtual cassette and the proposed DIVMA. Experimental results demonstrate that the virtual-cassette concept is valid for improving VM conjecturing accuracy; also this DIVMA is adequate for handling the indirect VM problem that has a coupling effect between those two subsequent tools.

UR - http://www.scopus.com/inward/record.url?scp=77955834441&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77955834441&partnerID=8YFLogxK

U2 - 10.1109/ROBOT.2010.5509719

DO - 10.1109/ROBOT.2010.5509719

M3 - Conference contribution

SN - 9781424450381

T3 - Proceedings - IEEE International Conference on Robotics and Automation

SP - 2107

EP - 2112

BT - 2010 IEEE International Conference on Robotics and Automation, ICRA 2010

ER -

Tsai WH, Cheng F-T, Wu WM, Lin TH. Developing a dual-stage indirect virtual metrology architecture. In 2010 IEEE International Conference on Robotics and Automation, ICRA 2010. 2010. p. 2107-2112. 5509719. (Proceedings - IEEE International Conference on Robotics and Automation). https://doi.org/10.1109/ROBOT.2010.5509719