Developing an automatic virtual metrology system

Fan Tien Cheng; Hsien Cheng Huang; Chi An Kao

doi:10.1109/TASE.2011.2169405

Developing an automatic virtual metrology system

Fan Tien Cheng, Hsien Cheng Huang, Chi An Kao

Research output: Contribution to journal › Article › peer-review

89 Citations (Scopus)

Abstract

Virtual Metrology (VM) is a method to conjecture manufacturing quality of a process tool based on data sensed from the process tool and without physical metrology operations. VM has now been designated by the International SEMATECH Manufacturing Initiative and International Technology Roadmap for Semiconductors as one of the focus areas for the next-generation factory realization roadmap of the semiconductor industry. This paper defines the VM automation levels, proposes the concept of automatic virtual metrology (AVM), and develops an AVM system for automatic and fab-wide VM deployment. The example of automatic VM model refreshing for chemical vapor deposition (CVD) tools is also illustrated in this paper. The AVM system has been successfully deployed in a fifth-generation thin-film-transistor-liquid-crystal-display (TFT-LCD) factory in Chi Mei Optoelectronics (CMO), Taiwan.

Original language	English
Article number	6051498
Pages (from-to)	181-188
Number of pages	8
Journal	IEEE Transactions on Automation Science and Engineering
Volume	9
Issue number	1
DOIs	https://doi.org/10.1109/TASE.2011.2169405
Publication status	Published - 2012 Jan

All Science Journal Classification (ASJC) codes

Control and Systems Engineering
Electrical and Electronic Engineering

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10.1109/TASE.2011.2169405

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title = "Developing an automatic virtual metrology system",

abstract = "Virtual Metrology (VM) is a method to conjecture manufacturing quality of a process tool based on data sensed from the process tool and without physical metrology operations. VM has now been designated by the International SEMATECH Manufacturing Initiative and International Technology Roadmap for Semiconductors as one of the focus areas for the next-generation factory realization roadmap of the semiconductor industry. This paper defines the VM automation levels, proposes the concept of automatic virtual metrology (AVM), and develops an AVM system for automatic and fab-wide VM deployment. The example of automatic VM model refreshing for chemical vapor deposition (CVD) tools is also illustrated in this paper. The AVM system has been successfully deployed in a fifth-generation thin-film-transistor-liquid-crystal-display (TFT-LCD) factory in Chi Mei Optoelectronics (CMO), Taiwan.",

author = "Cheng, {Fan Tien} and Huang, {Hsien Cheng} and Kao, {Chi An}",

note = "Funding Information: Manuscript received March 15, 2011; revised July 10, 2011; accepted September 01, 2011. Date of publication October 18, 2011; date of current version December 29, 2011. This paper was recommended for publication by Associate Editor J. Xiao and Editor S. Sarma upon evaluation of the reviewers{\textquoteright} comments. This work was supported in part by the National Science Council of the Republic of China (ROC) under Contract NSC99-2221-E-006-201, Contract NSC99-2221-E-006-233, and Contract NSC100-2622-E-006-011-CC2, and in part by the Ministry of Education of ROC under Project: AIM-HI. This paper was presented in part at the 2008 IEEE International Conference on Automation Science and Engineering, Washington, DC, August 2008.",

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Developing an automatic virtual metrology system

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