Development of a dual-phase virtual metrology scheme

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

This work proposes a Dual-phase virtual metrology scheme. To consider both promptness and accuracy, this scheme generates dual-phase virtual metrology (VM) values. Phase I emphasizes promptness; that is to immediately calculate and output the Phase-I VM value (denoted VMI) of a workpiece (wafer or glass) once the entire process data of the workpiece are completely collected. Phase II intensifies accuracy; that is not to re-calculate and output the Phase-II VM values (denoted VMII) of all the workpieces in the cassette (also called FOUP in the semiconductor industry) until an actual metrology value (required for tuning or re-training purposes) of a workpiece in the same cassette is collected. Besides, in this scheme, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated. The RI and GSI are applied to gauge the degree of reliance. If the reliance level of a VM value is lower than the threshold, this VM value may not be adopted. An illustrative example involving fifth-generation TFT-LCD CVD equipment is presented. Experimental results demonstrate that the proposed scheme is applicable to the wafer-to-wafer or glass-to-glass advanced process control for semiconductor or TFT-LCD factories.

Original languageEnglish
Title of host publicationProceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
Pages270-275
Number of pages6
DOIs
Publication statusPublished - 2007 Dec 1
Event3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007 - Scottsdale, AZ, United States
Duration: 2007 Sep 222007 Sep 25

Publication series

NameProceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007

Other

Other3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
CountryUnited States
CityScottsdale, AZ
Period07-09-2207-09-25

Fingerprint

Liquid crystal displays
Glass
Semiconductor materials
Gages
Process control
Industrial plants
Chemical vapor deposition
Tuning
Industry

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

Cite this

Cheng, F. T., Huang, H. C., & Kao, C. A. (2007). Development of a dual-phase virtual metrology scheme. In Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007 (pp. 270-275). [4341679] (Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007). https://doi.org/10.1109/COASE.2007.4341679
Cheng, Fan Tien ; Huang, Hsien Cheng ; Kao, Chi An. / Development of a dual-phase virtual metrology scheme. Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007. 2007. pp. 270-275 (Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007).
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Cheng, FT, Huang, HC & Kao, CA 2007, Development of a dual-phase virtual metrology scheme. in Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007., 4341679, Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007, pp. 270-275, 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007, Scottsdale, AZ, United States, 07-09-22. https://doi.org/10.1109/COASE.2007.4341679

Development of a dual-phase virtual metrology scheme. / Cheng, Fan Tien; Huang, Hsien Cheng; Kao, Chi An.

Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007. 2007. p. 270-275 4341679 (Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Cheng FT, Huang HC, Kao CA. Development of a dual-phase virtual metrology scheme. In Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007. 2007. p. 270-275. 4341679. (Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007). https://doi.org/10.1109/COASE.2007.4341679