Development of a generic virtual metrology framework

Hsien Cheng Huang, Yu Chuan Su, Fan Tien Cheng, Jia Mau Jian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

17 Citations (Scopus)

Abstract

Virtual metrology (VM) is a technology to predict metrology variables using information about the state of the process for every workpiece. An advanced dual-phase VM scheme possessing the properties of data preprocessing, dual-phase conjecturing, reliance-level evaluating, and similarity-level appraising was proposed by the author. This dual-phase VM scheme is applicable for all the typical VM applications. Among those applications, the one for workpiece-to-workpiece (W2W) advanced process control (APC) is the most critical. For easy implementation and deployment, a generic-virtual-metrology (GVM) framework shall be designed. The purpose of this paper is to develop the GVM framework. By applying this GVM framework, different VM functional modules can be easily implemented and applied for various kinds of VM applications, especially the W2W APC.

Original languageEnglish
Title of host publicationProceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
Pages282-287
Number of pages6
DOIs
Publication statusPublished - 2007
Event3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007 - Scottsdale, AZ, United States
Duration: 2007 Sept 222007 Sept 25

Publication series

NameProceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007

Other

Other3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
Country/TerritoryUnited States
CityScottsdale, AZ
Period07-09-2207-09-25

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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