TY - GEN
T1 - Development of device-level chemical-mechanical polishing simulation module using cellular automata method
AU - Yeh, Hsiu Ming
AU - Chen, Kuo Shen
PY - 2010
Y1 - 2010
N2 - This work briefly presents the basic theory, the development, and a primary demonstration of a device-level chemical-Mechanical Polishing (CMP) CAD module. By integrating the phenomenological material removing relation such as Preston's equation, contact mechanics, finite element analysis, with a cellular automata environment, this CMP CAD aims to predict the rounding, dishing, and erosion effects commonly observed in modern copper CMP processes. Primary results indicate that this CAD can essentially catch the characteristics of polishing processes. Further modification of this CAD would enhance its accuracy for industrial applications.
AB - This work briefly presents the basic theory, the development, and a primary demonstration of a device-level chemical-Mechanical Polishing (CMP) CAD module. By integrating the phenomenological material removing relation such as Preston's equation, contact mechanics, finite element analysis, with a cellular automata environment, this CMP CAD aims to predict the rounding, dishing, and erosion effects commonly observed in modern copper CMP processes. Primary results indicate that this CAD can essentially catch the characteristics of polishing processes. Further modification of this CAD would enhance its accuracy for industrial applications.
UR - http://www.scopus.com/inward/record.url?scp=78049441667&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78049441667&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:78049441667
SN - 9781439834022
T3 - Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
SP - 669
EP - 672
BT - Nanotechnology 2010
T2 - Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
Y2 - 21 June 2010 through 24 June 2010
ER -