Development of the nano-measuring machine stage

Wen Yuh Jywe, Yeau Ren Jeng, Yun Feng Teng, Hung Shu Wang, Chia Hung Wu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

In this paper, it was successfully developed a nano-measuring machine stage. It was used the features of a flexible structure to develop the nano-measuring machine stage. This stage includes two parts: one is a long range positioning X-Y stage and the other one is a four degrees-of-freedomicro-range stage. The flexible structure of the four degrees-of-freedom micro-range stage was included two kinds of an arc flexible body and a new two degrees-of-freedom flexible body. The micro-range stage was designed to compensate the moving errors such as vertical straightness error, pitch error and roll errors and its all moving range is 20mm × 20mm × 11μm. Precision feedback is provided by the six degrees-of-freedom measuring system with integrating the three plane mirror interferometers and a two degrees-of-freedom angular sensor.

Original languageEnglish
Title of host publicationProceedings of the 33rd Annual Conference of the IEEE Industrial Electronics Society, IECON
Pages2970-2973
Number of pages4
DOIs
Publication statusPublished - 2007 Dec 1
Event33rd Annual Conference of the IEEE Industrial Electronics Society, IECON - Taipei, Taiwan
Duration: 2007 Nov 52007 Nov 8

Publication series

NameIECON Proceedings (Industrial Electronics Conference)

Other

Other33rd Annual Conference of the IEEE Industrial Electronics Society, IECON
Country/TerritoryTaiwan
CityTaipei
Period07-11-0507-11-08

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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