Development of the nano-measuring machine stage

Wen Yuh Jywe, Yeau-Ren Jeng, Yun Feng Teng, Hung Shu Wang, Chia Hung Wu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

In this paper, it was successfully developed a nano-measuring machine stage. It was used the features of a flexible structure to develop the nano-measuring machine stage. This stage includes two parts: one is a long range positioning X-Y stage and the other one is a four degrees-of-freedomicro-range stage. The flexible structure of the four degrees-of-freedom micro-range stage was included two kinds of an arc flexible body and a new two degrees-of-freedom flexible body. The micro-range stage was designed to compensate the moving errors such as vertical straightness error, pitch error and roll errors and its all moving range is 20mm × 20mm × 11μm. Precision feedback is provided by the six degrees-of-freedom measuring system with integrating the three plane mirror interferometers and a two degrees-of-freedom angular sensor.

Original languageEnglish
Title of host publicationProceedings of the 33rd Annual Conference of the IEEE Industrial Electronics Society, IECON
Pages2970-2973
Number of pages4
DOIs
Publication statusPublished - 2007 Dec 1
Event33rd Annual Conference of the IEEE Industrial Electronics Society, IECON - Taipei, Taiwan
Duration: 2007 Nov 52007 Nov 8

Publication series

NameIECON Proceedings (Industrial Electronics Conference)

Other

Other33rd Annual Conference of the IEEE Industrial Electronics Society, IECON
CountryTaiwan
CityTaipei
Period07-11-0507-11-08

Fingerprint

Flexible structures
Interferometers
Mirrors
Feedback
Sensors

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

Cite this

Jywe, W. Y., Jeng, Y-R., Teng, Y. F., Wang, H. S., & Wu, C. H. (2007). Development of the nano-measuring machine stage. In Proceedings of the 33rd Annual Conference of the IEEE Industrial Electronics Society, IECON (pp. 2970-2973). [4460035] (IECON Proceedings (Industrial Electronics Conference)). https://doi.org/10.1109/IECON.2007.4460035
Jywe, Wen Yuh ; Jeng, Yeau-Ren ; Teng, Yun Feng ; Wang, Hung Shu ; Wu, Chia Hung. / Development of the nano-measuring machine stage. Proceedings of the 33rd Annual Conference of the IEEE Industrial Electronics Society, IECON. 2007. pp. 2970-2973 (IECON Proceedings (Industrial Electronics Conference)).
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Jywe, WY, Jeng, Y-R, Teng, YF, Wang, HS & Wu, CH 2007, Development of the nano-measuring machine stage. in Proceedings of the 33rd Annual Conference of the IEEE Industrial Electronics Society, IECON., 4460035, IECON Proceedings (Industrial Electronics Conference), pp. 2970-2973, 33rd Annual Conference of the IEEE Industrial Electronics Society, IECON, Taipei, Taiwan, 07-11-05. https://doi.org/10.1109/IECON.2007.4460035

Development of the nano-measuring machine stage. / Jywe, Wen Yuh; Jeng, Yeau-Ren; Teng, Yun Feng; Wang, Hung Shu; Wu, Chia Hung.

Proceedings of the 33rd Annual Conference of the IEEE Industrial Electronics Society, IECON. 2007. p. 2970-2973 4460035 (IECON Proceedings (Industrial Electronics Conference)).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Jywe WY, Jeng Y-R, Teng YF, Wang HS, Wu CH. Development of the nano-measuring machine stage. In Proceedings of the 33rd Annual Conference of the IEEE Industrial Electronics Society, IECON. 2007. p. 2970-2973. 4460035. (IECON Proceedings (Industrial Electronics Conference)). https://doi.org/10.1109/IECON.2007.4460035