Digital phase-shifting atomic force microscope Moiré method

Chia Ming Liu, Lien Wen Chen

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

In this study, the digital atomic force microscope (AFM) Moiré method with phase-shifting technology is established to measure the in-plane displacement and strain fields. The Moiré pattern is generated by the interference between the specimen grating and the virtual reference grating formed by digital image processes. The overlapped image is filtered by two-dimensional wavelet transformation to obtain the clear interference Moiré patterns. The four-step phase-shifting method is realized by translating the phase of the virtual reference grating from 0 to 2π. The principle of the digital AFM Moiré method and the phase-shifting technology are described in detail. Experimental results show that this method is convenient to use and efficient in realizing the microscale measurement.

Original languageEnglish
Pages (from-to)1182-1189
Number of pages8
JournalJournal of Physics D: Applied Physics
Volume38
Issue number8
DOIs
Publication statusPublished - 2005 Apr 21

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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