@article{1a8225297c8146f5be34b6d920d2b2f6,
title = "Direct CoSi2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation",
author = "Chang, \{Juin Jie\} and Liu, \{Chuan Pu\} and Chen, \{Shih Wei\} and Chang, \{Chih Chia\} and Hsieh, \{Tsung Eong\} and Wang, \{Ying Lang\}",
note = "Funding Information: The work is supported by the National Science Counsel, Taiwan, under Project No. NSC91-2120-E006-003. The authors are also grateful for the use of the sputter equipment in the Semiconductor Lab, which is supported and maintained by the Department of Materials Science and Engineering at National Cheng-Kung University, Taiwan. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.",
year = "2004",
doi = "10.1116/1.1781660",
language = "English",
volume = "22",
pages = "2299--2302",
journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "5",
}