Direct fabrication and patterning of Cu2O film by local electrodeposition method

Takeshi Fujiwara, Takuya Nakaue, Masahiro Yoshimura

Research output: Contribution to journalConference article

10 Citations (Scopus)

Abstract

We have developed a direct patterning method to form Cu2O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO4 and chelating agent. Cu2O pattern on the titanium substrates was successfully fabricated at 60°C. Furthermore, we found that the chelating agent, which has -CH(OH)COOH group, was effective to form crystalline Cu2O patterns.

Original languageEnglish
Pages (from-to)541-544
Number of pages4
JournalSolid State Ionics
Volume175
Issue number1-4
DOIs
Publication statusPublished - 2004 Nov 30
EventFourteenth International Conference on Solid State Ionics - Monterey, CA., United States
Duration: 2003 Jun 222003 Jun 27

Fingerprint

Chelating Agents
Chelation
Electrodeposition
electrodeposition
Fabrication
Capillary tubes
fabrication
Substrates
Titanium
Electrolytes
capillary tubes
Crystalline materials
Glass
titanium
electrolytes
methylidyne
glass

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Fujiwara, Takeshi ; Nakaue, Takuya ; Yoshimura, Masahiro. / Direct fabrication and patterning of Cu2O film by local electrodeposition method. In: Solid State Ionics. 2004 ; Vol. 175, No. 1-4. pp. 541-544.
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Direct fabrication and patterning of Cu2O film by local electrodeposition method. / Fujiwara, Takeshi; Nakaue, Takuya; Yoshimura, Masahiro.

In: Solid State Ionics, Vol. 175, No. 1-4, 30.11.2004, p. 541-544.

Research output: Contribution to journalConference article

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AU - Nakaue, Takuya

AU - Yoshimura, Masahiro

PY - 2004/11/30

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N2 - We have developed a direct patterning method to form Cu2O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO4 and chelating agent. Cu2O pattern on the titanium substrates was successfully fabricated at 60°C. Furthermore, we found that the chelating agent, which has -CH(OH)COOH group, was effective to form crystalline Cu2O patterns.

AB - We have developed a direct patterning method to form Cu2O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO4 and chelating agent. Cu2O pattern on the titanium substrates was successfully fabricated at 60°C. Furthermore, we found that the chelating agent, which has -CH(OH)COOH group, was effective to form crystalline Cu2O patterns.

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