Direct fabrication and patterning of Cu2O film by local electrodeposition method

Takeshi Fujiwara; Takuya Nakaue; Masahiro Yoshimura

doi:10.1016/j.ssi.2004.01.081

Direct fabrication and patterning of Cu₂O film by local electrodeposition method

Takeshi Fujiwara, Takuya Nakaue, Masahiro Yoshimura

Department of Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

14 Citations (Scopus)

Abstract

We have developed a direct patterning method to form Cu₂O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO₄ and chelating agent. Cu₂O pattern on the titanium substrates was successfully fabricated at 60°C. Furthermore, we found that the chelating agent, which has -CH(OH)COOH group, was effective to form crystalline Cu₂O patterns.

Original language	English
Pages (from-to)	541-544
Number of pages	4
Journal	Solid State Ionics
Volume	175
Issue number	1-4
DOIs	https://doi.org/10.1016/j.ssi.2004.01.081
Publication status	Published - 2004 Nov 30
Event	Fourteenth International Conference on Solid State Ionics - Monterey, CA., United States Duration: 2003 Jun 22 → 2003 Jun 27

All Science Journal Classification (ASJC) codes

General Chemistry
General Materials Science
Condensed Matter Physics

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10.1016/j.ssi.2004.01.081

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title = "Direct fabrication and patterning of Cu2O film by local electrodeposition method",

abstract = "We have developed a direct patterning method to form Cu2O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO4 and chelating agent. Cu2O pattern on the titanium substrates was successfully fabricated at 60°C. Furthermore, we found that the chelating agent, which has -CH(OH)COOH group, was effective to form crystalline Cu2O patterns.",

author = "Takeshi Fujiwara and Takuya Nakaue and Masahiro Yoshimura",

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journal = "Solid State Ionics",

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T1 - Direct fabrication and patterning of Cu2O film by local electrodeposition method

AU - Fujiwara, Takeshi

AU - Nakaue, Takuya

AU - Yoshimura, Masahiro

PY - 2004/11/30

Y1 - 2004/11/30

N2 - We have developed a direct patterning method to form Cu2O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO4 and chelating agent. Cu2O pattern on the titanium substrates was successfully fabricated at 60°C. Furthermore, we found that the chelating agent, which has -CH(OH)COOH group, was effective to form crystalline Cu2O patterns.

AB - We have developed a direct patterning method to form Cu2O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO4 and chelating agent. Cu2O pattern on the titanium substrates was successfully fabricated at 60°C. Furthermore, we found that the chelating agent, which has -CH(OH)COOH group, was effective to form crystalline Cu2O patterns.

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DO - 10.1016/j.ssi.2004.01.081

M3 - Conference article

AN - SCOPUS:10044279433

SN - 0167-2738

VL - 175

SP - 541

EP - 544

JO - Solid State Ionics

JF - Solid State Ionics

IS - 1-4

T2 - Fourteenth International Conference on Solid State Ionics

Y2 - 22 June 2003 through 27 June 2003

ER -

Direct fabrication and patterning of Cu₂O film by local electrodeposition method

Abstract

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