Direct fabrication and patterning of Cu2O film by local electrodeposition method

Takeshi Fujiwara, Takuya Nakaue, Masahiro Yoshimura

Research output: Contribution to journalConference articlepeer-review

10 Citations (Scopus)

Abstract

We have developed a direct patterning method to form Cu2O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO4 and chelating agent. Cu2O pattern on the titanium substrates was successfully fabricated at 60°C. Furthermore, we found that the chelating agent, which has -CH(OH)COOH group, was effective to form crystalline Cu2O patterns.

Original languageEnglish
Pages (from-to)541-544
Number of pages4
JournalSolid State Ionics
Volume175
Issue number1-4
DOIs
Publication statusPublished - 2004 Nov 30
EventFourteenth International Conference on Solid State Ionics - Monterey, CA., United States
Duration: 2003 Jun 222003 Jun 27

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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