Direct fabrication of oxide films by a microwave-hydrothermal method at low temperature

Jin Ho Lee, Naoki Kumagai, Tomoaki Watanabe, Masahiro Yoshimura

Research output: Contribution to journalConference article

11 Citations (Scopus)

Abstract

A new fabrication technique of oxide film (BaTiO3 film) has been investigated by the microwave-hydrothermal (M-H) method. The BaTiO3 films were directly fabricated on Ti substrates at low temperature (100 °C) and short holding time (below 1 h). The obtained phases were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The XRD patterns showed that a single phase of BaTiO3 film was formed on Ti plate. The formation process of BaTiO3 film was explained based on the photographs of SEM.

Original languageEnglish
Pages (from-to)41-45
Number of pages5
JournalSolid State Ionics
Volume151
Issue number1-4
DOIs
Publication statusPublished - 2002 Nov 1
EventSSP- 2000 - Tokyo, Japan
Duration: 2000 Dec 112000 Dec 13

Fingerprint

Oxide films
oxide films
Microwaves
microwaves
Fabrication
fabrication
X ray diffraction
Temperature
Scanning electron microscopy
scanning electron microscopy
photographs
Diffraction patterns
x rays
diffraction patterns
Substrates
diffraction

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Lee, Jin Ho ; Kumagai, Naoki ; Watanabe, Tomoaki ; Yoshimura, Masahiro. / Direct fabrication of oxide films by a microwave-hydrothermal method at low temperature. In: Solid State Ionics. 2002 ; Vol. 151, No. 1-4. pp. 41-45.
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Direct fabrication of oxide films by a microwave-hydrothermal method at low temperature. / Lee, Jin Ho; Kumagai, Naoki; Watanabe, Tomoaki; Yoshimura, Masahiro.

In: Solid State Ionics, Vol. 151, No. 1-4, 01.11.2002, p. 41-45.

Research output: Contribution to journalConference article

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