Direct patterning of dense cerium oxide thin film by developed ink-jet deposition method at moderate temperatures

R. Gallage, A. Matsuo, T. Fujiwara, T. Watanabe, N. Matsushita, Masahiro Yoshimura

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Direct fabrication of ceria film and patterns were conducted by an ink-jet deposition method where a precursor solution was jetted towards a heated substrate (≤ 300 °C) according to the required pattern without any post heat treatments. X-ray diffraction and Raman spectroscopic analyses revealed that the formed phases were crystallized CeO2 without any impurity phases and consisted of nanosized crystallites of < 10 nm. The thicknesses were several hundred nanometers and the width of the patterns was about 350 μm. The film was dense and showed a high optical transparency in the visible region(> 90%). Scanning electron microscopic analysis revealed that thin film patterns were free of cracks and all the films showed good adherence to the substrate.

Original languageEnglish
Pages (from-to)4515-4519
Number of pages5
JournalThin Solid Films
Volume517
Issue number16
DOIs
Publication statusPublished - 2009 Jun 30

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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