Direct writing of Si island arrays by focused ion beam milling

Shang En Wu, Chuan-Pu Liu

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

Abstract

We report on a new technique for the fast fabrication of well defined arrays of Si islands by means of a stigmated Ga+ focused ion beam without masks, resists or etching. Stigmating and defocusing the ion beam resulted in the direct formation of Si islands of different shape and size. The ordering of the island arrays was determined by the pattern of the beam scanning, and in this way nanometre-sized Si island arrays with hexagonal symmetry were accordingly produced. The effects of beam spot distortion and broadening on the milled structure are also examined by scanning electron microscopy imaging. With this technique, not only is the fabrication time shorter, but also the arrangement of the island arrays is possibly controllable.

Original languageEnglish
Pages (from-to)2507-2511
Number of pages5
JournalNanotechnology
Volume16
Issue number11
DOIs
Publication statusPublished - 2005 Nov 1

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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