Dual-phase virtual metrlogy method

Fan-Tien Cheng (Inventor)

Research output: Patent

Abstract

ABSTRACT OF THE DISCLOSURE A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.
Original languageEnglish
Patent number4584295
Publication statusPublished - 2008 Dec 18

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Cheng, F-T. (2008). Dual-phase virtual metrlogy method. (Patent No. 4584295).
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Dual-phase virtual metrlogy method. / Cheng, Fan-Tien (Inventor).

Patent No.: 4584295.

Research output: Patent

TY - PAT

T1 - Dual-phase virtual metrlogy method

AU - Cheng, Fan-Tien

PY - 2008/12/18

Y1 - 2008/12/18

N2 - ABSTRACT OF THE DISCLOSURE A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.

AB - ABSTRACT OF THE DISCLOSURE A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.

M3 - Patent

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ER -

Cheng F-T, inventor. Dual-phase virtual metrlogy method. 4584295. 2008 Dec 18.