Dual-phase virtual metrlogy method

Fan-Tien Cheng (Inventor)

Research output: Patent

Abstract

A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.
Original languageEnglish
Patent number10-0915339
Publication statusPublished - 1800

Fingerprint

Tuning

Cite this

Cheng, F-T. (1800). Dual-phase virtual metrlogy method. (Patent No. 10-0915339).
@misc{f5aff27c564e4e2c9ec01f9f10f5e9ff,
title = "Dual-phase virtual metrlogy method",
abstract = "A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.",
author = "Fan-Tien Cheng",
year = "1800",
language = "English",
type = "Patent",
note = "10-0915339",

}

Cheng, F-T 1800, Dual-phase virtual metrlogy method, Patent No. 10-0915339.

Dual-phase virtual metrlogy method. / Cheng, Fan-Tien (Inventor).

Patent No.: 10-0915339.

Research output: Patent

TY - PAT

T1 - Dual-phase virtual metrlogy method

AU - Cheng, Fan-Tien

PY - 1800

Y1 - 1800

N2 - A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.

AB - A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.

M3 - Patent

M1 - 10-0915339

ER -

Cheng F-T, inventor. Dual-phase virtual metrlogy method. 10-0915339. 1800.